Fogger

PWC Technologies

Beaverton, OR

An addition to the company's line of cleanroom products, a small handheld, battery-powered, ultrasonic fogger gun is portable and cleanroom compatible. It can deliver more than an hour of continuous fog on a single battery charge. The fog is produced from DI water by two liquid level—sensitive ultrasonic transducers and is controlled by a trigger switch, all of which are located on the fog gun. In addition to the gun and battery pack, the unit comes with a remote power supply, battery charger, and case.

Pressure-Reducing Regulator

Sensiflo

Colton, CA

Designed for gases and liquids, the SPR pressure-reducing regulator is suitable for corrosive applications and environments. It has inlet pressures up to 3600 psig; outlet pressures from 0 to 10, 25, 50, 100, 250, 500, or 750 psig; and a flow coefficient of 0.02, 0.06, or 0.20. With low operating torque and internal volume, the instrument can regulate high flows with only a small pressure drop. The regulator can be made from materials according to users' specifications, such as stainless steel, chromed brass, Monel, Hastelloy, and titanium. It contains stainless-steel diaphragms and a Kel-F seat.

Tube Cutter

E. H. Wachs

Wheeling, IL

The portable TQ 1.0 tube saw can be used to cut stainless-steel tubes with outside diameters of 1/8 to 1 in. With two-axis cutting capability, the tool enables weld sampling or coupon cutting of high-purity stainless tubing. The saw does not deform tube ends. Features include a clamping vise, a built-in vacuum port, rack-and-pinion feed, a motor with dial speed control, and a removable bench stand. The cutter comes with hand tools and saw blade in a custom-fitted storage case. The system is available in 110- and 220-V versions.

Defect Detection System

Hologenix

Huntington Beach, CA

The PBS-1000 Fast Mapper maps the level and distribution of subsurface defects in silicon and gallium arsenide materials. The system can map 8-in. wafers in 15 minutes at a scattered light detection level of 0.001 ppm/sr. In addition to defects caused by polishing, cleaning, and lapping, the system detects deposition-related flaws and defects introduced during processes such as ion implantation.

Chemical Filter

domnick hunter

Durham, England

The latest addition to a series of cartridge filters, Tetpor Plus filters submicron-sized amounts of acids, alkali, organic solvents, and other aggressive chemicals. The all-fluoropolymer cartridge has an absolute-rated PTFE membrane supported by PFA hardware and PTFE-encapsulated O-ring seals. Available in four ratings from 1.0 to 0.05 µm, the filter offers optimum flow rates, high-temperature resistance, excellent chemical compatibility, and low extractables. The 0.2- and 0.1-µm versions are integrity testable.

Minienvironment Filter Modules

Copper Plating Process

CirQon

Gurnee, IL

An economical alternative to thin-film sputtering, plated and bonded copper (PBC) on ceramic is a pure-metal copper plating process that produces fine lines. PBC features 96% alumina, while thin-film processes contain 99.6% alumina. The process is particularly suited for making hybrid power amplifier circuits. The technology uses photolithography to produce well-defined patterns and fine lines of thick, pure copper with high thermal dissipation and size density comparable to thin-film processes. Solid-filled pure-copper vias measure 7 mil diam.

Process Tool Monitor

KLA-Tencor

San Jose, CA

Designed for making semiconductors with geometries 0.18 µm, the AIT II patterned process tool monitor minimizes the number of wafers exposed to out-of-control process conditions. The system incorporates double-darkfield technology, which combines low-angle illumination and low-angle collection optics. The technology suppresses color variation and grainy background noise, increases small-particle sensitivity, and provides surface selectivity. This last capability minimizes the detection of previous-layer defects. The tool is particularly suitable for monitoring CMP and etch processes. The system's programmable spatial filters enhance defect collection on array structures, and selectable polarization of the illumination beam minimizes surface noise. The MultiSpot option provides multiple laser spot sizes for varying defect signal-to-noise ratios and optimizing throughput.

Spin Coating Valve

EFD

East Providence, RI

The adjustable fluid flow control and end-of-cycle snuffback features of the Model 725DA-SS valve eliminate drips in spin coating applications. A stainless-steel fluid chamber, an inert polymer diaphragm, and a sealing head isolate the actuator from wetted components to ensure trouble-free cycles. Compact and light, the valve is suitable for installation in automated assembly machines and robotic equipment. Deposit volume is accurate to ensure consistent film thickness on each wafer. Rapid, clean coating cutoff is designed to eliminate streaks. Dispense tips are available in different styles and sizes.

Pressure Regulator

Valcor Engineering

Springfield, NJ

Suitable for use with DI water, the Model SV100 liquid pressure regulator operates in temperatures 250°C. The regulator's adjustment knob can be set manually to determine or change the downstream pressure. All wetted components are made of virgin Teflon to minimize contamination, corrosion, and clogging. Other models feature a polypropylene body and various diaphragm elastomers, or both. Regulated outlet pressure is 15–60 psig. Other models offer outlet pressures of 0 to 40 psi and 5 to 100 psi. The regulator can be used for wafer cleaning and other high-purity applications.

UHV Shield Coating

Aerospace Coating Systems

Berlin, CT

Specially formulated for use in PVD etch chambers, ACS EG-28 coating increases the surface area and raises the surface roughness of an etch shield. This treatment makes each shield able to hold and contain extraneous particulates for a long time, extending the operation of a PVD etch chamber from approximately 900 to 12,000 cycles before a replacement shield is needed. The coating can then be stripped off the then original shield and reapplied. The coating can also be customized to suit specific applications.

Gas Cylinder Cleaner

Telsonic Ultrasonics

Bridgeport, NJ

The Tube Resonator uses only water to clean the inside of any gas cylinder. The tube is simply inserted into a cylinder filled with water. The system generates a multidirectional field of ultrasonic energy throughout the liquid in the cylinder. Bubbles caused by ultrasonic cavitation scrub contaminants from the cylinder wall. The system cleans even the smallest crevices inside the cylinder. Frequency range of the system's generator is 20,000­21,000 Hz. The resonator tube is made of titanium and stainless steel and operates at a frequency of 20 kHz. Length ranges from 9 to 70 in., and the tube can fit into cylinders with 3/4-in. openings.

Conductive Plastic Resins

Hyperion Catalysis International

Cambridge, MA

Conductive plastic resins filled with graphite Fibril nanofibers can be used in molded cleanroom tools such as wafer trays, bar code scanners, and tweezers. The resins produce a nonsloughing, glossy surface with low outgassing levels. The nanofibers measure 0.01 µm diam. Uniform distribution of the fibers ensures a dissipative range of 10⁴ to 10⁶ , eliminating ESD hotspots. Grades include PC, PBT, PPS, PP, and thermoformable PET-G conductive sheet.

Plasma Etch Tool

Mattson Technology

Fremont, CA

The Aspen LiteEtch TSE etches transistor isolation layers on advanced ICs without using hazardous chemicals. A replacement for high-throughput batch wet benches, the process tool uses an ICP source to generate fluorine-based dry process chemistries. Targeted for use after shallow trench isolation, the system is capable of etching layers on deep-submicron memory, flash, microprocessor, and logic devices where nitride hard mask is used as a CMP-stopping layer. The tool's chamber design ensures that films on both sides of the wafer are etched simultaneously in the chemical environments. The design also enables the etching of two wafers at a time in a single-chamber system and up to four wafers at a time in a dual-chamber system.

Tubing

Freelin-Wade

McMinnville, OR

Designed for high-purity applications, Pomalon tubing accommodates temperatures 250°F. The tubing is made of Kynar PVDF and features low extractable levels, low permeability, and low outgassing. It can be sterilized by gamma radiation, autoclaving, or ozone. Suitable for use with compression fittings, the tubing will not creep. It is available in sizes from 1/8 to 8 in. diam.

Vapor Delivery System

Aera

Austin, TX

Supplying a precise flow of chemical vapor to processes without using a carrier gas, the GS-437 vapor delivery system performs CVD and diffusion processes. The system's refill system is located in the same cabinet as the vaporizer, allowing safe chemical delivery and creating a smaller footprint than other vapor delivery systems. The cabinet and vaporizer are heated to prevent recondensation between the vaporizer tank and the process chamber, substantially reducing the risk of accidents and enabling the safe vaporization of a wide range of liquids and flows. The system's accuracy has been demonstrated at ±1% of full-scale flow with a repeatability of ±0.2% of full-scale flow.

Pressure Transducers

Data Instruments, Critical Fluids Group

Acton, MA

Series S1-Unamplified and Series F1-Unamplified transducers operate at output signals of 50 or 100 mV with an accuracy of 0.25% FS for high-purity measuring applications. Pressure ranges are 25­3000 psi in absolute, gauge, and compound units. The flowthrough F1 is 1.64 in. high; the single-port S1 measures 2.14 in. The transducers have an MTBF of 2.4 million hours and a lifetime of 100 million cycles. The instruments are made of 316L VIM VAR stainless steel with electropolished wetted surfaces. All transducers are manufactured in a Class 10 cleanroom.

Manifold System

Furon

Anaheim, CA

The MultiFlow manifold system houses 2 to 20 or more valves in a single package with a small footprint. The system's flow ranges from 0.5 to 2.7 Cv, making it suitable for CMP and slurry-mixing applications. The system accommodates temperatures of 0° to 82°C and has a flow factor of 2.7 Cv through the normally closed ports. It operates at up to 90 psig forward and full back pressure. All its wetted parts are made of high-purity PTFE and PFA. A single common inlet minimizes leaks. A variety of connector sizes, flow capacities, and valve functions are contained in a single unit. Options include manual actuation, trickle flow, and normally open and three-way port configurations. The system is assembled, tested, and packaged in a cleanroom.

Wafer Carrier

Fluoroware

Chaska, MN

The KA250 wafer carrier is molded of PEEK and a polycarbonate to ensure low-particulate operation and dimensional stability. The carrier's wafer and equipment contacts are made of Stat-Pro 3000, a static-dissipative PEEK material, while a polycarbonate is used in the frame and end wall. The design also ensures reliable equipment interface and robotic wafer transfer. StableWafer pocket design technology controls the wafer plane even when the wafer is removed from its pocket up to 2 1/2 in. from the fully seated position. This feature eliminates wafer chatter and flutter. Carriers can be colored red, blue, or green to differentiate wafer lots. End walls may also be a different color from the carrier's frame in order to extend color coding options. Additional identifying markers such as RF tags or adhesive bar code labels are also available.

CD-SEM

Applied Materials

Santa Clara, CA

Designed for sub-0.15-µm metrology, the VeraSEM accommodates both 200- and 300-mm wafers and can be upgraded to measure critical dimensions on sub-0.13-µm geometries. The system's process variation monitoring technology uses a column design and special algorithms to measure line edge roughness, line edge width variation, and open or closed contact holes. A high-speed stage, fast wafer handling, and accurate measurement algorithms ensure high throughput.