300-mm Wafer Robots

Motoman

West Carrollton, OH

SuperMechatronics OEM automation robots ensure particle-free operation for handling 300-mm wafers. The cleanroom and vacuum robots are available in 2-, 3-, 4-, and 5-axis configurations. Incorporating high-speed ac servo technology, the robots can be integrated with vision or laser sensing packages for wafer-mapping functions and with other peripherals, including conveyor systems, grippers, and workstations. Model SCR-M300CS has a payload capacity of 33/10 lb, a reach of 176/10 in. and a repeatability of ±0.002 in. Four other models are available with chemical-resistant features, CMP compatibility, and station-to-station applicability.

300-mm Ion Implanters

Eaton

Beverly, MA

A line of ion implanters for 300-mm wafer processing accommodates technology nodes from 0.25 through 0.13 µm. The product line comprises models HE3, MC3, and ULE3 for high-energy, medium-current, and ultra-low-energy applications, respectively. Featuring advanced automation capability, the implanters are designed to meet the need for increased yields and reduced die costs.

Vacuum Pump

Leybold Vakuum

Cologne, Germany/Export, PA

The oil-free, piston-operated EcoDry L pump minimizes hydrocarbon contamination. The pump incorporates permanently lubricated and sealed bearings placed outside the vacuum, which ensures trouble-free operation. No changing of fluids, traps, and filters is required. Nominal speed is 1100 rpm. The low-vibration pump is suitable for use in loadlock chambers, transfer chambers, inspection tools, mass spectrometers, and thin-film coaters. It can also be used as a dry prevacuum pump for high-vacuum systems.

Copper Control System

Parker Systems

Ontario, CA

Designed for copper electroplating processes, the PS2000 CuCS-DD system can control the composition of the pre- and posttreatment baths used in damascene and dual-damascene wafer processing. The on-line, automatic system measures 72 x 30 x 24 in. and offers an autotuner that provides closed-loop control. Paced replenishment rates are based on analytical results. This feature enables small, ongoing chemical replenishment and solution maintenance that can be automatically checked and adjusted for sulfuric acid, chloride, brightener, copper, and leveler.

Air Valves

Humphrey

Kalamazoo, MI

With HGF-series air valves, both primary and pilot exhaust air can be captured and removed from the cleanroom. Because the valves are approximately half the size of comparable valves, they save space and weight of the end product in which they are used. This not only conserves floor space but also reduces product shipping costs. The valves are available in three sizes for various flow requirements, with C^_v factors ranging from 0.28 to 1. Depending on the size selected, valve bodies measure 10, 15, or 18 mm. All valves are rated for air or inert gas up to 100 psig.

Tank Energy Meter

ppb

Palo Alto, CA

A multifrequency meter detects energy in ultrasonic cleaning tanks from 0 to 100 W/gal. The meter also detects and displays frequencies from 0 to 200 kHz. Operators can map overall energy distribution and transducer performance. The battery-operated instrument has 100 memory locations. The meter is PLC compatible with RS-232 downloading capabilities for date, time, average cavitation energy, and standard deviation. The meter's probe lens is positioned at a 45° angle from the rod, allowing users to point the lens perpendicular or parallel to the tank bottom to collect data. Readouts appear on an LCD. The meter accommodates fluid temperatures of 1° to 70°C.

Liquid CO^₂ Cleaner

EPAK Electronics

Somerset, England

The SuperFuge liquid CO^₂ system combines centrifugal forces, axial fluid shearing forces, and natural dry cleaning chemistry to clean wafers and other substrates. The environmentally friendly system is an alternative to vapor degreasers, aqueous cleaners, and ultrasonic cleaners. The system can be used to clean disk-drive heads and remove photoresist from silicon wafers. It includes a top-loading degreaser with manual or automatic closure, a recycler, and a parts basket. The recycler offers capacities of 280, 350, and 500 lb/hr. The liquid carbon dioxide is supplied at a rate of 750 to 850 psi and at temperatures of 40° to 70°F. The system footprint measures 8 x 8 ft.

Temperature Controllers

Noah Precision

San Jose, CA

Designed for use with wafer processing equipment, three point-of-use systems stabilize the temperature on the wafer to within a narrow range to enhance wafer-to-wafer repeatability. The modular design permits multizone control in the range of —20° to 90°C. A universal power supply/controller is housed in a single box and is compatible with host equipment communication protocols. The controller supports all current operating parameters and can be expanded to include measurement and display of the percentage of output power. An optional graphical user interface on the instruments' communication module displays real-time parameters and is capable of capturing data for later trend analysis. Models 2300, 3300, and 3500 operate at 500, 1200, and 2500 W, respectively.

300-mm Pod Door Opener

PRI Automation

Billerica, MA

The modular design of the PDO300 improves the serviceability of the pod door opener load port by making all drive and control modules replaceable in 15 minutes or less without disturbing the system's minienvironment. It can be removed and replaced without the need for realignment. The opener complies with current SEMI standards, CE requirements, and I300I guidelines. Options include E23 communications and rotating kinematic coupling.

Polyimides

HD MicroSystems

Tokyo, Japan

The pHD series of photodefinable polyimides provide ultrasharp resolution for both i- and g-line photolithography systems. The materials, which feature a high molecular weight and high glass-transition temperature, can be used for stress buffer, C-4, and bond pad redistribution layer applications. Another line of polyimides, the PI-2770 series, can be processed with standard TMAH-based developers on positive photoresist tracks. Recently improved, these offer enhanced adhesion and cured film properties.

300-mm Wafer Stage

New England Affiliated Technologies

Lawrence, MA

The NEAT MAS-300 x-y stage for 300-mm wafer positioning uses brushless linear servomotors to minimize stage vibration and ensure fast settling times. The stage's moving envelope measures less than 27 x 24 in.

CMP Particle Size Analyzer

Malvern Instruments

Southboro, MA

Using acoustic attenuation spectroscopy, the Ultrasizer measures particle size of CMP slurries from 0.01 to 1000 µm without dilution. The instrument can detect large aggregated populations and offer accurate analysis of smaller nanometer-size populations. No sample preparation is needed. Users pour slurries in concentrations of less than 50 volume percent directly into the instrument.

Pure Water Monitor

Bran + Luebbe

Buffalo Grove, IL

The Monitor 90S Silikometer accurately measures silica concentrations in ultrapure water down to 0.15 ppb. The monitor provides a true-zero measurement of sub-parts-per-billion concentrations, unlike silica measurement instruments that interpret 3—7-ppb silica as theoretical zero. The instrument consumes one-third of the reagents of other monitors. Self-diagnostic functions, automatic recalibration, and six on-line sample streams are additional features.

Imaging Spectrometer

Instruments S.A.

Stanmore, Middlesex, England

The Triax-320 imaging spectrograph/spectrometer offers a resolution of 0.06 nm and features optical design software that balances image quality, resolution, and stray-light rejection. The 0.32-m focal length instrument has an optional side exit slit, which allows it to be configured with both a CCD and single-channel detector or two single-channel detectors simultaneously. Used as a scanning spectrometer, the system's direct grating drive mechanism provides both high repeatability and accuracy. The high throughput and f/4.1 aperture of the corrected optics ensure accurate spectral imaging over a large exit focal plane, making the instrument suitable for use with large-area CCDs. All instrument functions can be automated. These include the spectrometer wavelength drive, grating changes, slits, entrance mirrors, and exit mirrors.

Fan Filter System

Enviroflex

Anaheim, CA

Combining several advanced technologies, a fan filter system allows users to individually control up to 12,800 fan filter units from a single PC. Depending on the room requirements, the system can be slowed down or speeded up with a few keystrokes or mouse clicks. The system is designed to permit staggered fan filter starts in order to save energy. The system operates on 0.8 A and 167 W from a 208-V, 1-phase power source. The fans are available with HEPA or ULPA filters. The system operates at 47 dBa.

White Sheet Material

BFGoodrich

Cleveland, OH

Suitable for use on wet benches and other cleanroom tools, Corzan 4910 postchlorinated polyvinyl chloride sheet material meets Factory Mutual Research requirements on smoke damage, corrosion resistance, and fire propagation. The material offers good weldability, chemical resistance, and mechanical strength. It can be used as an alternative to polyvinylidenefluoride (PVDF), ethylene-chlorotrifluoroethylene (ECTFE), and polytetrafluoroethylene (PTFE). It is also a substitute for flame- retardant polypropylene. The material is chemically resistant to most acids, bases, salts, and aliphatic hydrocarbons. Because it does not require additional fire suppression equipment, the material can reduce the overall construction costs of cleanroom-compatible tools.

Particle Size Analyzer

Particle Sizing Systems

Santa Barbara, CA

The Nicomp 380/ZLS combines dynamic light scattering and electrophoretic light scattering to measure both submicron particle size distributions and zeta potentials in one instrument. The system measures particles from 0.002 to 5 µm with zeta potential of 0.010 to 15 µm. An optical fiber attached to a precision stepper motor controls the angle of the light scattering. The instrument's disposable cuvette facilitates cleanup and reduces cross-contamination from previous samples.

Post-CMP Cleaner

Steag MicroTech

Austin, TX

The Trident 300 cleaning system combines aggressive dual-side, post-CMP vertical brush cleaning and multiple wet cleaning operations in a single tank. The system cleans up to 60 wafers/hr, and its flexible design permits integration with 300-mm CMP systems or stand-alone operation for dry-in/dry-out performance using FOUP or carrier handling. The dual vertical brush scrubber offers cog wheels for edge cleaning without witness marks. Closed-loop brush pressure control, quick-dump capability, and simultaneous megasonics are additional features. The cleaning module houses a single 81/2-L tank for placing wafers so that no wafer transition occurs through the liquid/air interface between process steps. A high-velocity in situ rinse and carrierless operation ensure low consumption of chemicals and water.

TOC Analyzer

OI Analytical

College Station, TX

The Model 1010 uses persulfate oxidation methodology to analyze samples containing 2 ppb to 10,000 ppm of organic carbon. The instrument stores up to 10 methods and 10 run sequences, with a choice of DOS- or Windows-based control. The WinTOC program simplifies data analysis and sample auditing.

Product Extra!

Kseries strippers/cleaners from Ashland-ACT are formulated for use with low-K dielectric materials. Currently in beta site tests, the new chemicals can be used with materials such as FOx, FLARE, and SiLK, according to Ashland. Data are available on the chemicals' metal-etch rates and compatibility with low-K dielectric materials. The supplier also offers ACT NP-970 sidewall polymer remover for copper substrates. Information: 614/ 790-6075.

Catalyst is a yield-enhancing software program from ObjectSpace Fab Solutions that minimizes variations in process wafers and detects early problems in both the tools and processes. The program reduces output variations in photolithography, plasma etch, CMP, deposition, and other processes. The technology was created as part of the Advanced Process Control Framework Initiative involving AMD, Honeywell, and Sematech.

ObjectSpace will sell Catalyst under an exclusive licensing agreement with Honeywell. The program will be available in the first quarter of 1999. Information: 512/391-4000.

Nikon Precision has introduced six upgrades for its step-and-repeat lithography tools. The company has improved the steppers in the areas of control, diagnostics, illumination, and mechanics. Available as retrofits, the improvements are designed to offer higher throughput, easier maintenance, and increased performance capabilities over previous models. Monitoring baselines are also offered. The enhancements for the NikonNEST system include a controller upgrade to a PC-based Windows NT version called NikonNEST 2. Also offered are two specialty reticles for image plant optimization and alignment optimization. Information: 650/508-3819.

A line of calibration standards and supporting equipment for the company's Permissible Exposure Limit program has been developed by Matheson Gas Products. Calibration standards are offered in the 100-L, Mini-MAT 6R refillable cylinder. Empty cylinders can be returned to Matheson. Information: 800/416-2505.

Osmonics has opened an international service and testing center for Tonkaflo pumps. The center's technicians disassemble and inspect pumps, determine the failure, make repairs, and ensure the pumps conform to original factory specifications. The center serves customers throughout Europe, the Middle East, and Africa. Tonkaflo pumps are high-pressure, centrifugal pumps for RO systems. Information: 612/933-2277.

Scott Semiconductor Gases has introduced a method for delivering high-purity carbon dioxide. The vendor's Continupure system supplies a special type of CO^₂ called Precision Clean for surface cleaning applications. The system delivers the gas from bulk storage to the point of use without compromising purity, Scott says. Information: 512/444-1867.

Designed for use with the supplier's Opti-Probe systems, GO Global Optimizer analysis and recipe-development software integrates the capabilities of Therma-Wave's thin-film measurement tool software and advanced film stack analysis capabilities. The GO software runs off-line, making film stack analysis, recipe development, and modification possible without having to enter the fab. The program facilitates the creation of Opti-Probe job files without interrupting production measurements, and it supports recipes for all models of the process control tools. Information: 510/490-3663.

New software from Schlumberger Automated Test Equipment is designed to improve measurement success rates on CMP layers and STI processes by more than 50%. Developed for use with the IVS-120 metrology tool, Adaptive RG software offers the capability to measure targets with either unclear images or suboptimal edge resolution. Uneven polishing in the STI processes required for higher device densities can result in inconsistent target measurement features, according to the supplier. Information: 408/453-0123.

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