CMP Retaining Ring Carrier

Strasbaugh

San Luis Obispo, CA

The ViPRR variable-input pneumatic retaining ring produces uniformity to within 3 mm of the wafer's edge. For use on the company's Symphony-CMP and Model 6DS-SP CMP tools, the carrier can be employed for advanced planarization applications to 0.18 µm. It is made of corrosion-resistant titanium, which makes it compatible with most CMP slurries. The ring is made of PET, a thermoplastic polyester that demonstrates stiffness, chemical and abrasion resistance, and low center line porosity. (Semicon Europa, Booth 1610)

Wafer-Transfer Tool

Daitron

Wilsonville, OR

The WT-8000 system automatically transfers wafers, decreasing scratches from vacuum wands and eliminating the risk of repetitive injury. The tool moves wafers from a process cassette into a "coin stack" shipping container or from a shipping container into a process cassette. The orientation mark is found before the wafer is transported into the shipping container or placed into the cassette. An ESD separator is placed between each wafer during the packing mode and removed during the unpacking mode. An OCR system with host interfacing helps maintain process integrity. (Semicon Europa, Booth 492)

CMP Slurry Analyzer

Horiba

Irvine, CA

The LA-920 particle-size analyzer can monitor CMP slurry aging and detect the presence of large agglomerates that can scratch wafer surfaces, ruin batches, and lower yields. The QC tool measures the size of very fine particles from 0.02 to 2000 µm in the slurry, attaining high resolution in approximately 30 seconds. Self-calibrating, the analyzer is precision guaranteed by the company to within 0.6%. The tool features 87 detectors and multiple wavelengths and can display as many as 300 3-D measurement result files. The operator can check particle distribution in real time. (Semicon Europa, Booth 1312)

Getter Pump Flange

SAES Getters

Milan, Italy

The MK5 series of the company's SORB-AC and CapaciTorr getter pumps features a radiation-resistant connector that can be baked up to 350°C and is directly welded on the CF flange. The new MK5 flange makes it possible to bake the vacuum system without disassembling the pump connector unit. The MK5 series uses a standard K-type Cromel/Alumel thermocouple that replaces the previous shielded thermocouple and eliminates the need for a CF 16 flange. (Semicon Europa, Booth 316)

Ionization Bar

Simco

Hatfield, PA

The nonmetallic germanium emitters on the CleanTrac ionization bar offer particle-free ionization. The bar can be used in minienvironments, laminar-flow benches, and other Class 1 areas where particle contamination and static control are important. To minimize particle buildup on emitters, the unit neutralizes electrostatic charges on the work surface through the use of a gas-flow technology that operates with clean dry air or dry nitrogen. Compatible with several controllers, CleanTrac comes in lengths from 1 to 6 in. (Semicon Europa, Booth 413)

Photochemical Dispense System

Millipore

Bedford, MA

Suitable for I-line and deep-UV processes, the IntelliGen photochemical dispense system offers two-stage dispense technology that allows dispense and filtration rates to be controlled independently, without the need for manual adjustments. The filtration rate can change without affecting the repeatability of dispense volume, and once the volume is set no additional adjustments or recalibrations are required. With dispense volumes accurate to within 0.20 ml, the amount dispensed is repeatable at three standard deviations. The compact system's Impact LHVD filter, which is made of an ultra-high-molecular-weight polyethylene hollow-fiber membrane, is compatible with most photoresists. (Semicon Europa, Booth 709)

Filter Cartridges

BTR Environment Vokes

Guildford, England

The polypropylene melt-blown microfiber media in Polyfil II cartridges retain 99.98% of all particles down to 0.5 µm in gases and liquids. The filtration area is 0.4 and 0.6 m² per 10-in. module. Because of their continuously graded pore structure the first two layers provides prefiltration while the final layer provides the absolute rating. The cartridges come in single or multiple modules measuring 5, 10, 20, 30, or 40 in. Fifteen particle-retention ratings are available.

HVAC Air Purifier

Airguard Industries

Louisville, KY

The Bio-Aire UV system uses ultraviolet light to kill microorganisms in HVAC systems without producing ozone or secondary contaminants. The system is designed to put out six times more energy than traditional UV lamps operating in temperatures as low as 32°C. The air purifier comes in several models and sizes to suit the installation requirements of all central HVAC systems.

Stainless-Steel Parts

New England Electropolishing

Falls River, VA

Electropolished stainless-steel parts are passivated and finished down to 2 Ra. The redeposition of a clean, chemically bonded oxide layers makes the components corrosion resistant. Electropolishing selectively removes the high points on the surface to 0.001 in. to produce a burr-free part. The parts have no hydrogen embrittlement, coatings, or residues.

RTP System

AG Associates

San Jose, CA

Designed for 0.18-µm production applications, the Starfire 200-mm rapid thermal processing system features open architecture to allow future process integration, high throughput with rates approaching 80 wafers per hour, and atmospheric wafer transfer. The low cost of ownership system accommodates shrinking geometries by meeting technical and manufacturing requirements for high-density chips. The RTP tool offers a Brooks Automation wafer-handling platform and robotics, MESC-compatible interface, uniform and repeatable processing that is independent of wafer backside emissivity, purged-wafer I/O loadlocks, and NO and N^₂O process capabilities. (Semicon Europa, Booth 647)

Process Simulator

Alberta Microelectronic Centre

Edmonton, Alberta, Canada

The UNIX-based Simbad program simulates the growth of thin metallic films over ULSI topography. The system uses a three-dimensional transport model combined with a two- and three-dimensional ballistic deposition model to simulate processes such as sputtering of single metals or alloys, evaporation, and plasma etching. The simulator provides thickness-uniformity profiles, and microstructure indications as well as spatial, energy, and angular flux distributions at the substrate. The simulator enables users to detect problems before processing and determine optimal metallization parameters. The analytical tool requires 32 Mb of RAM and 100 Mb of disk space.

Reflection Metrology Tool

AXIC

Santa Clara, CA

The X-Caliber grazing reflection metrology tool can make standardless measurements in 10 seconds, allowing multipoint mapping. The tool operates at very short wavelengths and provides precise, rapid measurement of surface and interfacial microroughness. It also measures film or substrate density and linear thin-film thickness. The noncontact and nondestructive tool can be used for single-layer and multilayer metal films as well as dielectrics such as Ti/TiN, tantalum pentoxide, and barium strontium titanate. Density and surface microroughness can be measured on silicon, gallium arsenide, and other bulk materials. (Semicon Europa, Booth 1509)

Etch System

Tegal

Petaluma, CA

An updated version of the 900 series noncritical etch system uses approximately one-third less cleanroom space than previous models. While the previous system's footprint is 243/10 sq ft, the 900e model fits in 16 sq ft. Available in two standard reactor configurations, the system comes with a fixed-gap-diode design configured to either 6 mm or 38 mm between two planar electrodes. The automated line transport system is compatible with quartz, GaAs, silicon, glass, and InP substrates in square format from 100 to 125 mm per side and round substrates from 75 to 150 mm diam. Gas flow for four process gases, RF power, reactor and wafer electrode temperature, and reactor pressure can be independently controlled. (Semicon Europa, Booth 1158)

Liquid Particle Sensor

Particle Measuring Systems

Boulder, CO

The Ultra DI 50 monitors particles in DI water during the manufacturing process, counting and sizing contaminants down to 0.05 µm. The unit operates with a high sample volume that provides statistical data for clean water systems and permits an operator to clean up quickly between stations. The sensor's smooth, nonshedding material resists most cleaning solvents. A status indicator displays laser, power, and activity. Four sizing channels enable an operator to analyze specific areas of interest. Data from the tool can be directly transmitted to a workstation using an Ethernet connection for real-time analysis. (Semicon Europa, Booth 1024)

Thin-Film Metrology Tool

Nanometrics

Sunnyvale, CA

The NanoSpec 6100 metrology tool measures a wide range of film types and thicknesses on both single and multiple film stacks. The compact, tabletop analyzer incorporates the spectrophotometer measurement head from the company's 8000X-series products. The head contains no moving parts and provides fast, accurate film thickness measurement. The tool uses a Windows 95—based user interface and offers measurement flexibility. A computer- controlled stage permits discrete measurement at preprogrammed locations as well as the creation of film uniformity maps. (Semicon Europa, Booth 947)

Mass-Flow Controllers

Unit Instruments

Yorba Linda, CA

For ion implanters, CVD systems, and other applications that require extremely low-pressure delivery, Safe Delivery Source mass-flow controllers evacuate highly toxic gases from a source bottle at subatmospheric pressures. The Model 1662 and ultraclean Model 8162 MFC units operate at true 10-torr differential pressure at low flows of 2—5 std cm³/min. By ensuring precise and safe delivery of process gases, the units help reduce costs. The Model 1662 features a 10-µin.-Ra surface finish, while the 8162 has a 4-µin.-Ra surface finish. (Semicon Europa, Booth 1028)

Product Extra!

Lam Research's microwave stripper option for its high-density TCP 9600SE metal-etch system aims to increase productivity, reduce cost of ownership, and expand process capabilities to the sub-0.25-µm range. The option offers fast strip rates and diagnostic features that maximize uptime. It also increases system throughput by 2—3 wafers per hour. The stripper's downstream plasma eliminates the potential for charge-induced damage of thin gate oxide, making the system suitable for processing devices with linewidths below 0.25 µm. Additional features are damage-free resist removal, corrosion control, and complete polymer removal. Information: 510/572-4538. (Semicon Europa, Booth 1351).

Tip evaluation software from Digital Instruments allows users of NanoScope AE Dimension and MultiMode TM microscopes to get maximum use out of their tips without the risk of gathering bad data with a dull tip. The software was previously available only for Digital Instruments' large, automated AFMs. The program evaluates whether the tip meets a selected tip sharpness criterion or should be replaced. The package includes the proprietary evaluation software and a roughness standard, which is scanned as part of the evaluation. Based on the analysis, the evaluation software presents worst-case tip sharpness in numerical and graphical form, as well as an image of the tip itself. Information: 805/967-1400. (Semicon Europa, Booth 1762).

An extended warranty program from Genus covers accelerators on the vendor's line of Kestrel ion implanters. Under the new factory warranty, accelerators are guaranteed against failures or degradation in performance for 4 years on the Kestrel 650 and 5 years on the Kestrel 750. Both warranties cover all accelerator components except for the internal accelerator turbopump, which is guaranteed for two years. As part of the new program, customers may schedule a no-cost accelerator inspection at any point in the warranty period. The voluntary inspection program is designed to give Genus's customers additional assurances about tool performance and reliability. The warranty remains in effect even if the customer does not request an inspection. Information: 408/747-7120. (Semicon Europa, Booth 601, 1350).

Ordela, a Tennessee-based laboratory, has developed a production instrument capable of measuring alpha contamination levels in semiconductor wafers and materials >=3 x 10^—4 alpha counts/cm²/hour/resolution element from 3 to 10 MeV. The Model 8208A Frisch-grid ionization chamber accepts whole 8-in. silicon wafers and other materials for ultra-low-level alpha spectrometry. According to the company, the chamber measures not only alpha contamination but also alpha particle energies, allowing rapid, accurate, and direct flux determination. The ionization chamber uses P-10 counting gas, which is a mixture of 10% methane and 90% argon. It also employs a multichannel analyzer for alpha spectrometry. Information: 423/483-8675.

FASTech Integration's STATIONworks delivers off-the-shelf drivers and the basic technology required to rapidly roll out configurable solutions for automating semiconductor equipment. The plug-and-play product integrates with FACTORYworks to provide users with the complete set of capabilities required to create a Windows NT station control solution. The system automates fab operations such as yield management, WIP tracking, and equipment maintenance. In addition, STATIONworks features FASTech's tool object model (TOM) capability, which offers a library of the industry's off-the-shelf equipment drivers configured to the TOM specifications for specific semiconductor manufacturing equipment. Information: 617/259-3131. (Semicon Europa, Booth 942).

Users of process gas management components and analytical tools from MKS Instruments can now receive around-the-clock technical support. Service representatives will be on hand 24 hours, 7 days a week to provide technical assistance for equipment installation, troubleshooting, and production support for all MKS products. Information: 800/227-8766, ext. 4619. (Semicon Europa, Booth 1363).

Anatel's new TOCView software for Windows 3.1, Windows 95, and Windows NT provides users with bidirectional communication between any IBM-compatible computer and one or more Anatel A-1000 and A-2000 total oxidizable carbon analyzers. The software can be connected to one or two A-1000 systems with as many as eight sensors linked to each other. It can also be connected to a single A-1000 sensor through an RS-232-C interface, to one or two A-2000 wide-range TOC analyzers, or to a combination of an A-1000 on one serial port and an A-2000 on another. The software is useful for controlling instrumentation, displaying and saving data, printing reports, and downloading information to spreadsheet software. Information: 800/373-0531.

Manufactured for use with HCl and other high-purity specialty gases, the Mirro-Clad from CP Industries is designed to eliminate particle contamination and corrosion in the bulk storage of the most corrosive gases. The interior surface of the cylinder is plated electrolytically with nickel 200 and polished to 20 µin. Ra. With end closures made of Hastelloy C-22 and secured with external threads and a Viton seal, the cylinder's gas-wetted surface remains clean and corrosion resistant. Information: 412/664-6604.

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