Product Technology News

300-mm Process Platform

GaSonics International

San Jose, CA

Designed for fabrication of devices with 0.18-µm geometries, the Millennia platform is a multichamber, multiprocess tool for 300-mm wafer processing. The system uses downstream microwave technology for photoresist removal and postetch-clean applications. By integrating four modular process stations onto one platform, the system maximizes overall equipment effectiveness while minimizing floor-space requirements. Each process station can be optimized individually for maximum throughput and a customized process. Applications include high-dose implant, photoresist removal, scum removal, postetch clean, backside etch, and isotropic etch. (Semicon West, San Francisco, South Hall, Booth 1316)

CMP Cluster Tool

Peter Wolters of America

Plainville, MA

The PM200 cluster tool offers users a customized way to meet planarizing requirements from R&D to full production. The system is designed to process 200-mm and smaller wafers at a rate of up to 50 per hour. The tool comprises two cleaners, two polishers, and an integrated handling system that occupies 6 m² of floor space. Each unit is available separately and can operate independently so that planarizing can begin in an R&D setting using only a polishing unit. Remaining units can be added to achieve full production later. Cluster software provides fully integrated control of each tool through a master control station, as well as the ability to control the complete cluster through a host computer. Options include in situ end-point detection and a bar-code reader. (Semicon West, San Francisco, North Hall, Booth 6668)

Fittings Clamp

EVAC

Buchs, Switzerland

A high-temperature chain clamp rapidly connects glass flanges and fittings used in sputtering, plasma etching, and CVD processes. The unit operates for 12 hours at temperatures up to 150°C and runs continuously at 100°C. Compatible glass components are available in Duran or quartz for chemical resistance and ease of cleaning. For the clamp's seal, two different O-ring materials can be used with the Teflon centering ring. Viton can be used for vacuum applications, while an FEP silicone O-ring seamlessly coated with Teflon can accommodate semiconductor processes. The chain clamp maintains a durable seal while remaining soft enough not to break the glass. (Semicon West, San Francisco, South Hall, Booth 2134)

Flowmeters

Asahi/America

Malden, MA

Because they lack moving parts, Universal Vortex flowmeters can provide repeatable ±1% accuracy without fluid contamination. Pipeline flow rates are measured electronically using vortex shedding technology. The units are suited for aggressive or easily contaminated flow media such as ultrapure water. On-site consultation, supervision, and training are all available on request. (Semicon West, San Francisco, South Hall, Booth 630)

Single-Cartridge Housings

Filterite Div. of Memtec

Timonium, MD

SOC-series single-cartridge filter housings have a polypropylene head and a choice of either a SAN or polypropylene bowl. Designed for liquid filtration, the housings accept 10-in. double-open-end filter cartridges and internal O-ring seal cartridges. Fixed guides in the head and shell ensure proper alignment and seating of the cartridges. Maximum operating pressure is 125 psig at 68°F. Various mounting options are available. (Semicon West, San Francisco, North Hall, Booth 6053)

150-mm Wafer Cassette

Empak

Colorado Springs, CO

The X6153-series transport cassette protects 150-mm wafers from ESD damage, molecular contamination, and abrasion-induced particulation. Featuring an advanced wafer pocket design for optimum lift clearance during transfer, the cassette is molded of polypropylene-based Emstat AR+, an economical alternative to resins such as PEEK. The cassette comes in a variety of colors. (Semicon West, San Francisco, North Hall, Booth 5743)

Pipe Flow Software

Applied Flow Technology

Woodland Park, CO

A flow-analysis program for incompressible piping systems, AFT Fathom 3.0 incorporates new features while retaining the drag-and-drop modeling of its predecessors. The software requires 4-MByte RAM and is available for Windows 3.1, 3.11, 95, and NT operating systems. Features include coupled heat-transfer analysis and system-energy balance, modeling of variable-speed pumps, viscosity corrections for pumps, and pump and system curve graphs for complex parallel piping systems. A turn-off capability that enables quick evaluation of multiple scenarios is also standard. The software models the flow distribution in complex piping systems, including systems with multiple pumps and control valves. Numerous output options are offered, including an enhanced visual report window, which incorporates output predictions with the graphical schematic assembled by the user.

Chart Recorders

M-Tek

Pittsburgh, PA

Fan-fold NEMA-4 chart recorders are designed for long-term continuous recording of flow. Available in splashproof enclosures for pH, conductivity, SO^₂, NOx, and ozone, the 4-in. units accept J, K, T, R, S, and E thermocouples or Pt-100 RTDs. They also accommodate 4­20 mA or voltage from 0 to 50 V dc. The recorders come in flush, panel, and portable mounting configurations. Each configuration has a baked-on, two-component, black-textured urethane coating to prevent rust and corrosion. Accuracy exceeds ±1/2% and full-scale response time is < 1/2 second. Adjustable set points for alarm or control, which feature SPDT relay contacts rated for 5 A at 125 V noninductive, are also available.

Membrane Contactor

Hoechst Celanese

Charlotte, NC

The 10-in. Liqui-Cel Extra-Flow membrane contactor for degasification enhances UPW systems that operate at >227 m³ /hr by providing a hollow-fiber membrane that can withstand high temperature and pressure. The pressure rating of >7 kg/cm² allows four contactors to run in series without repressurization. The temperature rating of 70°C expands the contactor's operating limits. Maximum flow capacity per contactor is 47.7 m³/hr. Technical features include modularity, minimal space requirements, accurate modeling, and quiet operation. (Semicon West, San Francisco, South Hall, Booth 1901)

Pressure Transducer

MKS Instruments

Andover, MA

The Type 631 absolute heated Baratron pressure transducer combines 150°C operation and onboard electronics. The transducer is designed to prevent contamination buildup and particle generation in processes such as LPCVD nitride. The unit offers ±0.25% of reading accuracy including nonlinearity, hysteresis, and nonrepeatability. The elimination of sensor-to-electronics cables and remote mounting of the electronics package can improve measurement repeatability. Accuracy as well as zero- and span-temperature coefficient specifications have improved over the results yielded from the previous model with separate electronics. (Semicon West, San Francisco, North Hall, Booth 5943)

Toxic Gas Transmitters

Enmet Analytical Instruments

Ann Arbor, MI

SDS-series two-wire 4­20-mA transmitters feature a digital display. The transmitters use maintenance-free disposable electrochemical cells for oxygen and a range of gases, including CO, H^₂S, PH^₃, AsH^₃, HCl, HCN, BCl^₃, HF, SiH^₄, COCl^₂, Cl^₂, SO^₂, O^₃, and NH^₃. EX-5000-series transmitters with catalytic-type sensors can be integrated to form complete toxic and combustible gas monitoring systems. The transmitters are housed in sealed NEMA-4X aluminum enclosures measuring 41Ž2 * 31Ž2 * 21Ž5 in. and supplied with conduit fittings. (Semicon West, San Francisco, Esplanade Ballroom, Booth 4309)

Ball Valves

Worcester Controls

Marlborough, MA

Series WK70 tube bore clean valves prevent the buildup of various contaminants in a variety of high-purity processes. Available in dimensions of 1/2 to 2 in., the ball valves offer controlled metallurgy, featuring forged parts of 316L stainless steel and a standard internal surface finish of 25 Ra, or an optional finish of 10 Ra. Seats of TFE, reinforced TFE, and Polyfill provide bubbletight shutoff through the valve under conditions of high-vacuum and high-cycle operation. Valves are designed for manual on/off operation as well as automated operation of cyclic batch processes. High-cycle stem seals supply external sealing for valve automation. Series 39 pneumatic or Series 75 electric actuators are offered for automated switch control. Electronic and pneumatic positioners are also available.

CMP Filter Assemblies

Pall

Port Washington, NY

The CMP Kleen-Change 100 filter assembly series is designed for the filtration of metal and oxide polishing slurries. The completely encapsulated, disposable polypropylene filters can reduce potential contamination, minimize contact with the process slurry, and eliminate the need to clean the housing. Assemblies can be installed at mixing stations, in distribution loops, and at polishing tools. Units contain polypropylene filter media available in absolute ratings of 5 to 120 µm. Permanently sealed filter elements can eliminate errors caused by incorrect fitting of cartridges and seals. Because of the encapsulated design, changeouts are quick, with a low holdup volume to minimize slurry waste. (Semicon West, San Francisco, Esplanade Ballroom, Booth 4202)

CVD Film

Genus

Sunnyvale, CA

LRS, a dichlorosilane CVD film, extends the life of tungsten silicide­based manufacturing processes beyond 0.25 µm. The low-resistance, low-stress film can provide improved adhesion and 20% lower sheet resistance after anneal compared with standard DCS films. It enables tungsten silicide­based processing of devices with linewidths as small as 0.18 µm. Available as a new process module for the Genus 7000 platform, the film can be integrated into existing process flows to offer good step coverage, low fluorine content, and a high deposition rate. (Semicon West, San Francisco, South Hall, Booth 2202)

ICP Mass Spectrometer

Perkin-Elmer

Norwalk, CT

The PE Sciex Elan 6000 inductively coupled plasma mass spectrometer rapidly analyzes inorganic elements using a Windows NT­based program. The fully automated system's PlasmaLok ICP-MS interface eliminates undesirable secondary discharges and reduces spectral background, allowing detection of elements such as potassium and iron to the low parts-per-trillion level. An AutoTune feature permits simple adjustment of operating parameters. Sample introduction, plasma, interface, lens, quadrupole, and related major subsystems are under computer control. Built-in diagnostics continuously monitor more than 40 operating parameters. The system's footprint is 0.72 m for easy installation in most cleanrooms.

Ultrapure-Water Systems

Millipore

Bedford, MA

Milli-Q ultrapure-water systems can be upgraded with the addition of purification stages such as capillary-fiber ultrafiltration for pyrogen reduction and UV photooxidation for ultralow organic levels. The systems can monitor both TOC and resistivity, and they contain Quantum ultrapure cartridges that polish water for specific applications. Multilingual alphanumeric displays and a point-of-use dispenser are standard features. (Semicon West, San Francisco, North Hall, Booth 5843)

Portable Environmental Controls

Electro-Tech Systems

Glenside, PA

Model 517 controlled environment systems monitor temperature and humidity inside chambers up to 64 cu ft at 32°­120°F and 5­98% RH. Temperature is regulated to an accuracy of ±1°C. Humidity is controlled with an accuracy of ±2% RH over the range of 0­90% RH, and ±3% RH over the range of 90­100% RH at ambient conditions. Housed in white acrylic enclosures, the portable units measure 91/2 * 221/2 * 181/2 in. and can be added to existing chambers or gloveboxes. The systems are suited for various applications including fabrication, storage, testing, and conditioning of a wide product range.

Double-Sided Scrubber

Dainippon Screen/
DNS Electronics

Kyoto, Japan/Sunnyvale, CA

The SS-80BW-AR double-sided spin scrubber operates at an accelerated wafer-transfer speed and reduced spin-drying time. The four-scrubber-head design increases processing speed and offers a throughput of up to 144 wafers/hr. The scrubber's horizontally rotating brush removes surface particles from both sides of the wafer, and an advanced pressure control ensures performance stability at low brush pressures. The rotational speed of the brush can be controlled separately for each recipe, and brush height can be adjusted quickly by entering numerical values from the system's main control panel. Optional D-Sonic scrubbing eliminates fine particles with DI water. (Semicon West, San Francisco, North Hall, Booth 6580)

Scanning Electron Microscope

Topcon Technologies

Sunnyvale, CA

The Opti-SEM 300 combines the high depth of field and feature-location capabilities of an optical microscope with a high-resolution SEM. A reference crosshair correlates directly to the E-beam position. Features located with the optical microscope can be automatically aligned for SEM analysis. Locating larger features, viewing low-contrast features like stains, and observing sample deformation during pumpdown are also possible. (Semicon West, San Francisco, South Hall, Booth 2402)

Fab Automation System

PRI Automation

Billerica, MA

Designed for processing 300-mm wafers, a complete automation system comprises stockers, transport components, intrabay automation, tool automation systems, and material control software. Simulation, planning, and design services are offered to optimize material flow. Tool buffers are provided to process equipment vendors on an OEM basis to ensure compatibility with fabwide automation systems. (Semicon West, San Francisco, North Hall, Booth 6168)

Wet-Scrubber Monitor

PureAire Monitoring Systems

Rolling Meadows, IL

An in situ gas detection and measurement system monitors wet scrubber emissions. The stack monitor can provide accurate detection in harsh environments with 100% RH, >=60% hydrogen, and little or no oxygen. Supplied for hydrogen chloride, hydrogen fluoride, chlorine, and other fluoride and chloride gases, the unit consists of an in situ electrochemical sensor and interface module linked to a dedicated controller or to a customer-supplied/ control/alarm device. The system can be installed indoors or outdoors and can operate at 24 V dc. Less than one hour of maintenance and calibration is needed annually. Standard controller outputs include local audio and visual alarms, dual-level alarm relays, and 4­20-mA analog output. Serial output is optional.

High-Performance Polymer

Victrex USA

West Chester, PA

Used for 200- and 300-mm wafer carriers, PEEK polymer provides dimensional stability under load, chemical and wear resistance, and a low rate of shedding. Carriers made from the high-performance plastic are designed to improve device yield, minimize equipment downtime, and lengthen carrier lifetimes.

CMP Cleaning Tool

OnTrak Systems

San Jose, CA

The Synergy Integra is designed for integration in a variety of CMP polishing systems. The tool combines simultaneous mechanical brush scrubbing and in situ chemical etching in a single system. The unit's open-architecture platform enables integration with various suppliers' CMP polishing systems to provide a fully automated polishing and cleaning solution. The one-step process delivers high throughput. (Semicon West, San Francisco, Gateway Hall, Booth 3612)

Sidewall Cleaner

Olin Microelectronic Materials

Norwalk, CT

An aqueous, organic solution used to remove post-plasma-etch sidewall polymer residues for via and metal layers, Microstrip 5002 reduces chemical consumption and disposal costs. The product's pH-balanced chemistry cleans residues such as aluminum oxide and silicon oxide on metal stacks. Because the cleaning system does not require an IPA rinse, users can save downtime and the product's bath life is extended. For additional process-related efficiency, the cleaner's formulation also minimizes environmental emissions and permits nonhazardous disposal of used products. The Microstrip product line includes a combination sidewall polymer cleaner/positive resist stripper as well as the 5002 solution.(Semicon West, San Francisco, North Hall, Booth 5425)

Defect-Analysis Software

LPA Software

Burlington, VT

An addition to the supplier's Yield Management System, the DIOSS digital image optical storage system provides rapid access to defect, image, and analysis data stored in a video disk "jukebox" or on magnetic media. A storage capacity of 600 GByte enables the system to manage more than 5 million images and defect data for more than 200,000 wafers. The system uses local disk caching, position management, and look-ahead scheduling to give multiple users concurrent access to current and historical defect and image data. (Semicon West, San Francisco, South Hall, Booth 243)

Metering Valve

Fluoroware

Chaska, MN

A five-turn manual valve, the Accuflo precisely adjusts flow. The metering valve's all-PFA body and stem are corrosion resistant for clean, long-lasting operation. The device withstands pressures < or =100 psig at ambient temperature and temperatures < or =300°F at < or =25 psig. The valve is available with a 1/4-in. orifice and multiple end connections. (Semicon West, San Francisco, North Hall, Booth 5944)

Dielectric Etch System

Applied Materials

Santa Clara, CA

Designed for dielectric etching of high-aspect-ratio features in deep submicron devices, the IPS Centura features inductively coupled, parallel-plate etch technology, and low consumables costs. The system is suitable for applications such as self-aligned contacts, high-aspect-ratio contacts, dual damascene structures, and other critical procedures for devices ¾0.25 µm. Variables such as temperature, power, pressure, and plasma uniformity are tightly controlled to produce precise etch results. The system has an output of more than 3000 wafers per chamber between wet cleans. Recovery time is less than 4 hours. The IPS can be retrofit on Centura systems. (Semicon West, San Francisco, North Hall, Booth 6181)

Automatic Wafer Loader

Dage Precision Industries

Aylesbury, Buckinghamshire, England/
Fremont, CA

The IM-80 automatic wafer loader can simplify and expedite the visual inspection of wafers measuring 100 to 200 mm. Designed to automatically transfer wafers from standard Fluoroware cassettes, the CE-compliant system presents the wafers aligned for both front and back inspection. Macroinspection on the front surface takes from 0.1 to 10 seconds. (Semicon West, San Jose, McEnery Hall, Booth 11216)

Sputter Process Monitor

Spectra International

Morgan Hill, CA

The Vision 1000-P sputter process monitor is designed for simple on-line process gas analysis. Data can be sent directly to the process tool. The unit comprises a compact Smart Head RGA with a PVD enclosed ion source and close-coupled inlet. Integral Process Eye software uses a "go/no-go" screen message to alert the operator to any deviation from a normal event. The software can also measure process deviation and offer a feasible solution. (Semicon West, San Francisco, North Hall, Booth 6468)

Ion Implanter

Eaton

Beverly, MA

The ULE2 ion-implantation system is designed to meet the demanding requirements for the formation of ultrashallow junctions in the 0.18- and 0.25-µm device nodes. The unit's design incorporates automated dose control, plasma-cell charge control technology, and RF-source technology. A fixed pentode extraction electrode with no moving parts, a 135° mass analysis magnet with embedded quadrupole lenses, and a GSD-type end station are additional features. Capable of running more than 200 hours without component failure, the ion source automatically tunes from "off" to a new recipe in less than 2 minutes. The system also offers contamination-free energy purity down to 500 eV without using deceleration. (Semicon West, San Francisco, North Hall, Booth 5526)

Sputtering Shield Kit

Semiconductor Equipment
Technology

Pleasanton, CA

Designed for use in Varian 3290 sputtering equipment, the CRS ceramic ring shield kit can increase wafer throughput between shield changes by minimizing the amount of in-film and mechanical particles. The turnkey kit includes all components required for the shield change. The unit comprises a stainless-steel shield, a ceramic ring, four wafer clips, and four ceramic-ring inserts. All components are ultrasonically cleaned, fully assembled, vacuum packaged, double bagged, and supplied in a cleanroom-compatible box. Use of the kit can also lessen downtime by reducing wafer handling and etch-related errors.

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