EDITOR'S PAGE
The
American alternative
The
October 2004 edition of the World Fab Watch database states that two-thirds
of probable future fabs will be built in the Asia-Pacific region. These
data should surprise no one who's familiar with the exodus of chip manufacturing
to Taiwan, South Korea, Singapore, and China. For many Americans, the
trend is seen as part of a troubling erosion of technological and economic
strength. For most players in the semiconductor world, this outsourcing
is just a part of doing business in a rapidly evolving market.
But
not every U.S. chipmaker has jumped on the Asian fab migration bandwagon.
To the surprise of many observers, Texas Instruments has decided to build
its next 300-mm fab in Richardson, TX, not far from the company's Dallas
headquarters and existing 300-mm factory, DMOS6.
Several
presentations at October's ISMI Manufacturing Effectiveness symposium
in Austin offered insights into the planning for the new Fab One. In her
keynote address, Shauna Sowell, TI's vice president and manager of DFAB,
laid out the rationale for the decision to build the new fab in the Lone
Star State. Of course, tax breaks and other incentives from the state
played a major role, but one of the most intriguing reasons Sowell noted
is Fab One's sustainability model.
Sowell
cited a benchmarking study of global 300-mm fabs revealing that the Asian
projects had a 50% cost advantage, mostly because of lower initial facilities
costs. In order to compete on a cost basis, the TI design team focused
on lowering certain initial costs (Fab One will be a two-level factory,
for example) and life-cycle costs, since utility expenses often exceed
construction expenses over a fab's life. According to the executive, these
efforts to bring down life-cycle expenditures will help meet the company's
goal of reducing Fab One's costs per square foot by 30% compared with
DMOS6.
Other
papers at the symposium offered specifics on TI's plans to construct and
operate Fab One in a sustainable fashion. Paul Westbrook described how
his team's approach uses energy modeling, works with the tool and support
equipment vendors on source load reduction, takes advantage of minienvironments
in the HEPA coverage and gowning areas, and optimizes and integrates the
facilities systems—all without raising capital expenditures. He estimates
that these efforts will save TI about $750,000 in the first year of operations
and about $3 million annually at full build-out.
In
his presentation on water sustainability, Pablo Ruiz noted that changes
in the management of the three main types of water at the new fab—DI,
industrial waste, and city—could result in significant savings. One example
showed a scheme for reusing industrial wastewater for point-of-use abatement
systems and scrubbers that could save more than $1.3 million a year.
Later
in my Texas sojourn I toured DMOS6 and had a chance to chat with two key
members of the management team: fab manager Sima Salamati-Saradh and company
vice president Larry Tolson. We
discussed how the lessons learned during the ramp of the 300-mm facility
have improved TI's overall manufacturing abilities and bode well for a
successful start-up of the new facility.
When
I saw DMOS6 in March 2001, the large, open ballroom had one functioning
litho cell and other tools scattered around the central area and adjacent
rooms. Three-and-a-half years later the scene was quite different. Most
of the waffle-floor was occupied by production toolsets, the overhead
automation tracks were active with wafer lots, and more equipment was
coming in, as the 90-nm ramp continued. Salamati-Saradh said that getting
the fab automation to work, especially the software, was "a painful learning
curve" but that the system has now "proven out to be great." She estimates
that the fab is running in the "mid-80s" range in terms of automated delivery,
a number Tolson believes is higher than many 300-mm fabs he's seen.
Sowell,
Salamati-Saradh, and Tolson all admitted that DMOS6's 130-nm ramp was
not without its difficulties. One humbling moment came when benchmarking
studies revealed that TI's Taiwanese foundry partners had gone, in less
than a year, from well behind the IDM in yield and production metrics
to way ahead. After taking their medicine at 130, the TI executives say
the 90-nm ramp has gone much better, with Tolson emphasizing big improvements
in the interactions between the process development and production teams.
When
you combine the 300-mm process and manufacturing expertise developed at
DMOS6 with the innovative design-for-environment approach the company
is taking with Fab One, TI presents a promising, cost-conscious alternative
to the further erosion of the U.S. chip-manufacturing base.
Tom Cheyney
Editor
tom.cheyney@cancom.com

MicroHome |
Search | Current Issue | MicroArchives
Buyers Guide | Media Kit
Questions/comments about MICRO Magazine? E-mail us at cheynman@gmail.com.
© 2007 Tom Cheyney
All rights reserved.
|