A conversion kit from Mantis Deposition allows users to switch between a fully dedicated radio-frequency (RF) atom source and an RF ion source. The dual-purpose kit consists of a prealigned molybdenum grid set (complete with power supplies), which can be exchanged with the RF atom source's aperture-plate configuration. Neutral atomic species are beneficial for growing high-quality compound materials. In RF atom-source mode, the kit uses dissociated atomic species that allow oxides or nitrides to be grown at low pressure and at reasonable substrate temperatures. The source can be used in many film-growth applications, including gallium nitride, GaInNAs, ultrathin Al₂O₃, and high-k dielectrics. The RF ion source uses beams of accelerated ions that can modify and erode surfaces under vacuum conditions. The beams can also be used to sputter a target material to project a plume of material for deposition onto a substrate. Information: www.mantisdeposition.com.

Enhanced software is available for Model 5200 PanelPrinter photolithography systems from Azores. The software enables precision n-point alignment of multiple points on one layer over corresponding points on the previous layer, ensuring near-perfect registration. This "least-squares" method uses algorithms to calculate the minimum total square distance between all corresponding points. With as few as three alignment points, data can be recorded in terms of x, y, Θx, Θy, and magnification in x and y. The equations resulting from these data provide positioning information and enable high precision in aligning multiple layers. The Model 5200 systems provide photolithography for large-area substrate applications that require 0.8–4-µm resolution. Subsystems include a high-fidelity projection lens and illumination system, a precision x-y stage, an automated substrate-alignment system, an automated reticle-handling and -storage system, and metrology sensors. Information: www.azorescorp.com.

Particle Measuring Systems offers a new enclosure for its Ultra DI products, which measure particles in ultrapure water systems down to 0.03 µm. The stainless-steel enclosure includes a dual air-filtration system. The combination of filters, including a HEPA-type filter, creates the equivalent of a sub-10,000-Class environment inside the enclosure. The environment ensures long laser life, improves reliability, and eliminates premature laser failures. Information: www.pmeasuring.com/products/liquid/upw/ultraDI. (Semicon Japan, 8A-809)

Watlow's Configurator edition of Watview, a human-machine-interface PC-based software package, is available for free download and unlimited use. The software allows users to set up and monitor the company's controllers. It connects one or more controllers, equipped with serial communications, to a PC running Windows. The software includes a recipe template builder and recipe editor feature, enabling users to save sets of parameters and then download them to one or more controllers. It can also back up or transfer settings among multiple controllers and store an almost unlimited number of profiles on a PC. The software can be used in many applications, including ovens and furnaces. Information: www.watlow.com. (Semicon Japan, 2A-512)

Pall Microelectronics has modified its AresKleen inorganic purification media to include carbon monoxide (CO) filtration capabilities. CO is widely used in plasma etch processes. Designed for use with Gaskleen point-of-use purifiers, the AresKleen material offers sub-parts-per-billion purification of many gases. The media capture and remove impurities such as oxygen, moisture, carbon dioxide, and metal carbonyls, which are harmful to semiconductor processes. Information: www.pall.com. (Semicon Japan, 3B-707)