The
ClearIQ is an enhanced version of an earlier-generation tool
for cleaning masks and glass plates. Intended to help customers
get more use from their mask sets, the tool offers excellent
cleaning performance for both binary and phase-shift mask layers.
It can also be configured to clean glass plates. Based on the
GAMA automated wet-clean system, the tool has been optimized
to aid both reticle manufacturing and meet the fast-turn needs
of fab reticle cleaning. In the area of reticle manufacturing,
it can be used for complete photoresist strip, postash residue
removal, preclean after-strip, and final clean steps. In the
fab, it removes photoresist, ash residue, and ionic and particle
contamination. The unit also contains the LuCID2 dryer for static-free
drying.
Wafer
Transfer/Loadlock System
Transfer
Engineering and Manufacturing
Fremont,
CA
A
compact system, the high-vacuum-compatible TEAM-Mate Cassette
300 performs wafer transport motions similar to those of costly
cluster-tool robots. The unit loads wafers or other flat substrates
from a cassette into SEMI-standard or custom process modules.
Exterior motors power the magnetically coupled elevator system
and linear guide mechanism, allowing substrates to be loaded
and removed repeatedly without breaking vacuum. Because the
linear guide mechanism is incorporated into the chamber wall,
the overall unit has a small footprint. The system can handle
wafers, masks, or substrates up to 300 mm and can be operated
as a stand-alone system or in conjunction with other tools via
an RS-232 connection.
Cordless
Vacuum Wafer Wand
H-Square
Sunnyvale,
CA
A
battery-operated vacuum wand for 200- and 300-mm wafers runs
continuously for three hours after 90 minutes of charging. By
connecting the self-contained wand to a power supply, users
can operate it even when the batteries have been discharged.
Ergonomic finger contours enhance comfort and ease of use. A
tabletop- and wall-mount stand keeps the unit clean and secure
when it is not in use. The wand weighs less than 8 oz and is
Class 1–compatible. (Semicon Japan)
Enclosed
Adjustable-Speed Drives
Schneider
Electric
Palatine,
IL
Enclosed
Square D adjustable-speed drives offer high voltage-sag immunity
and high communications capabilities. The Altivar CL8839 58M
family of drives is designed for semiconductor processing and
other industrial applications. The drives have built-in Ethernet
connectivity. They comply with SEMI F47 voltage-sag requirements
and are available in an extended rating up to 500 hp. Packaged
in Type 1, Type 12, integrated, or barriered enclosures for
wall or floor mounting, the drives have an optional door-mounted
display center with a three-color matrix screen for clear messaging.
Prepunched conduit knockouts assure easy installation, and job-specific
approval drawings speed project cycle times. A four-position
selector switch simplifies monitoring and control capabilities.
Pressure
Regulator
Saint-Gobain
Performance Plastics
Garden
Grove, CA
The
Furon 1/4-in.
UPRP pressure regulator is available in both manual- and pneumatic-actuated
versions. The regulator delivers aggressive pure chemicals and
DI water at precisely determined levels while maintaining constant
downstream pressure. Its body is constructed from 100% virgin
injection-molded high-purity PFA, while the diaphragms are made
of PTFE/Fluoroloy T, which helps to prolong regulator life.
The result is a regulator with a high-purity, all-fluoropolymer
wetted flow path that can operate in temperatures up to 194°F.
The unit features a PTFE isolation bellows designed to protect
system chemistry. The pneumatically actuated version features
a secondary diaphragm to protect the compressed-air system.
Standard on both versions is an integral leak-detection port
that simplifies monitoring in critical applications. (Semicon
Japan)
Integrated
Metrology Tool
Nanometrics
Milpitas,
CA
An
integrated metrology tool combines two measurement technologies.
The NanoOCD/DUV 9010 incorporates both ultraviolet optical critical
dimension (OCD) spectroscopic ellipsometry and deep ultraviolet
(DUV) spectroscopic reflectometry. The instrument provides thin-film
and film-stack thickness measurements on pads as well as oxide,
nitride, and trench profile measurements on arrays. The complete
metrology technology, providing measurements over the entire
range of measurement requirements for each process, can be used
for lithography, CVD, copper CMP, dielectric CMP, polysilicon
etch, and dielectric etch applications. The tool features polarized,
normal-incidence spectroscopic ellipsometry for noncontact OCD
measurements in the 320–780-nm wavelength range. Its DUV
spectroscopic reflectometry function provides single- and multilayer
film-thickness measurements as well as information on film optical
properties and reflectance in the 190–780-nm wavelength
range.
Cleanroom-Compatible
Filters
Purafil
Doraville,
GA
Cleanroom-compatible
filters can minimize defects caused by airborne molecular contamination
(AMC). The Purafilter-CG and Purafilter-FFU use patented dry-chemical
media to target specific groups of gases in specific cleanroom
areas. The media permanently remove AMC by transforming the
gases into harmless solids. The filters do not contain materials
that produce chemical contamination, nor do they offgas trace
metals or dopants. They can be incorporated into most fan filter
units upstream of HEPA/ULPA filters. Three media types are offered:
CPS, used for removing hydrogen sulfide, sulfur dioxide, organics,
and ozone in wet hoods and metal deposition applications; PSAM,
used for removing acids, amines, ammonia, and NMP in photolithography
applications; and PSPB, used for removing arsine, boron trifluoride,
chlorine, hydrogen chloride, hydrogen fluoride, hydrogen sulfide,
and phosphine in etch, ion implantation, and metal deposition
applications.
Liquid
Optical Particle Counter
Particle
Measuring Systems
Boulder,
CO
An
updated version of the HSLIS-series in situ liquid optical particle
counters comes with Ethernet capability, enabling manufacturers
to use existing Ethernet networks to control and monitor multiple
particle counters and thus lower overall costs. Furthermore,
the particle counters now contain a Hitachi laser diode, which
substantially increases laser life and provides improved mechanical
stability and lower laser operating temperature. Used for measuring
filter efficiency and performing real-time control of particulate
contamination in ultrapure water and process chemicals, the
counters have sizing thresholds starting at 0.05 µm for
DI water and 0.06 µm for process chemicals. The units are
available with four sizing channels and can be easily integrated
into facility monitoring systems. (Semicon Japan)
Storage
System/Stocker
SK
Daifuku
Salt
Lake City, UT
A
storage system and 300-mm sorter promote automated material
handling. The integrated unit combines the Clean Stocker CLS-50
automated storage system with Recif's SIS300-series sorter.
The system improves the flexibility of a fab's wafer transport
system while reducing lead times and tool footprint. Featuring
a modular design, the fast, compact system can be expanded as
needed with minimal downtime. The high-throughput unit has an
average cycle time of 13 seconds, and with its HID noncontact
or brush-type power supply, it meets Class 1 cleanroom standards
and complies with all SEMI and safety standards. The SIS300
sorter uses a patented transfer technology, providing embedded
wafer alignment and ID read with vacuum-free edge contact. (Semicon
Japan)
Extractive
Gas Monitor
PureAire
Monitoring Systems
Lake
Zurich, IL
An
extractive gas-detection system continuously monitors gas-storage
areas, process tools, scrubber systems, and other areas where
maintenance access may be limited or undesirable. Featuring
a sophisticated electronic "brain" built directly into the sensor
electronics, the Air Check Advantage extractive gas monitor
detects hazardous gas leaks and releases while significantly
reducing calibration and maintenance time and labor. Available
for ammonia, chlorine, fluorine, HCl, HF, hydrides, and many
other toxic or corrosive gases, it monitors locations up to
100 ft away. Standard features include a local digital display,
4–20-mA analog output, and a renewable plug-in sensor.
For simple off-site calibration, the instrument incorporates
self-supervised electronics that automatically alert personnel
to the condition of the sensor, the wiring, and smart sensor
electronics.
ESD
Monitoring System
Credence
Technologies
Soquel,
CA
The
fully integrated, real-time Octopus ESD monitoring system controls
electrostatic damage to ICs during handling. Installed on IC
handlers, the system monitors ESD exposure to each individual
IC at each step of the handling operation. ICs exposed to elevated
ESD levels are automatically separated to prevent shipment of
exposed components. Statistical data on the ESD environment
inside the handler are collected and an alarm is issued if the
number of discharges exceeds preset levels. The monitor helps
to increase yields by providing real-time alerts to personnel
about ESD incidents. Continuous monitoring of ESD events and
separation of exposed components improves process reliability.
Machine
Control System
Intelligent
Motion Systems (IMS)
Marlborough,
CT
MicroLynx,
a machine control system, is a panel-mounted assembly with a
bipolar stepper motor microstepping drive. Small enough to fit
in the palm of the hand, the easy-to-install system is available
with two drive selections: 12–48 V dc, 3 A rms, 4 A peak;
and 24–75 V dc, 5 A rms, 7 A peak. A version of the unit
with the DeviceNet option conforms to ODVA volume II, release
2.0, errata 3, as a position controller (device type 16). Communication
with the controller is accomplished through either I/O or explicit
messaging, and upgrading the product in the field is accomplished
with an optional DeviceNet programmer cable.
Mechanical
Vacuum Pump
Norgren
Littleton,
CO
SmartPump,
a vacuum management tool, offers a reliable, safe option for
all mechanical vacuum pump applications. The pump features high-vacuum
flow, low air consumption, an intuitive programming interface,
intelligent part present, and automatic blowoff. The pump's
intuitive interface controls vacuum. The pump generates vacuum
and maintains the preset level for as long as the user needs
to hold the object. It generates only the vacuum it needs, when
it needs it. The intelligent, part-present function automatically
switches off the compressed airflow once the preset levels have
been achieved and only switch- es the air on again if a system
leakage is detected. The automatic blowoff function ensures
that when vacuum cups are used, they do not remain attached
to the object once the vacuum is released. Because it requires
only one air, vacuum, and electrical connection, the pump can
be installed quickly.
Field
Emission SEMs
Leo
Electron Microscopy
Oberkochen,
Germany
ULTRA
field emission scanning electron microscopes (FESEMs) provide
ultra-high-resolution topographic and compositional imaging
combined with an analytical specimen chamber. The ULTRA FESEM
has a fully integrated backscattered electron detector system.
The energy- and angle-selected back-scattered (EsB) detector
is positioned in the Gemini electron optical column directly
above the high-efficiency in-lens secondary-electron (SE) detector.
The EsB detector is used for imaging with backscattered electrons,
providing compositional information about the specimen surface.
The EsB detector is an integral part of the Gemini column and
is easy to use. The SE detector is used for clear imaging of
surface details with secondary electrons. The instrument provides
clear imaging of boundaries and features, since backscattered
electrons are not highly sensitive to charging and edge contrast,
making it useful for metrology applications.
Continuous
Gas-Emission Monitor
Pfeiffer
Vacuum
Nashua,
NH
The
OmniStar mass spectrometer monitors the gas output of semiconductor
fab scrubber/abatement systems for toxic and greenhouse gases.
The unit monitors gas emissions continuously and can measure
up to 64 different ones simultaneously in concentrations from
100% down to ≤10 ppm. It monitors the gas output of scrubber/abatement
systems to ensure that they are operating properly and cleaning
up exit gases. If a gas concentration exceeds specified limits,
an out-of-range warning informs fab personnel that corrective
action should be initiated.
The
ClearIQ is an enhanced version of an earlier-generation tool
for cleaning masks and glass plates. Intended to help customers
get more use from their mask sets, the tool offers excellent
cleaning performance for both binary and phase-shift mask layers.
It can also be configured to clean glass plates. Based on the
GAMA automated wet-clean system, the tool has been optimized
to aid both reticle manufacturing and meet the fast-turn needs
of fab reticle cleaning. In the area of reticle manufacturing,
it can be used for complete photoresist strip, postash residue
removal, preclean after-strip, and final clean steps. In the
fab, it removes photoresist, ash residue, and ionic and particle
contamination. The unit also contains the LuCID2 dryer for static-free
drying.
A
compact system, the high-vacuum-compatible TEAM-Mate Cassette
300 performs wafer transport motions similar to those of costly
cluster-tool robots. The unit loads wafers or other flat substrates
from a cassette into SEMI-standard or custom process modules.
Exterior motors power the magnetically coupled elevator system
and linear guide mechanism, allowing substrates to be loaded
and removed repeatedly without breaking vacuum. Because the
linear guide mechanism is incorporated into the chamber wall,
the overall unit has a small footprint. The system can handle
wafers, masks, or substrates up to 300 mm and can be operated
as a stand-alone system or in conjunction with other tools via
an RS-232 connection.
Cordless
Vacuum Wafer Wand
Enclosed
Square D adjustable-speed drives offer high voltage-sag immunity
and high communications capabilities. The Altivar CL8839 58M
family of drives is designed for semiconductor processing and
other industrial applications. The drives have built-in Ethernet
connectivity. They comply with SEMI F47 voltage-sag requirements
and are available in an extended rating up to 500 hp. Packaged
in Type 1, Type 12, integrated, or barriered enclosures for
wall or floor mounting, the drives have an optional door-mounted
display center with a three-color matrix screen for clear messaging.
Prepunched conduit knockouts assure easy installation, and job-specific
approval drawings speed project cycle times. A four-position
selector switch simplifies monitoring and control capabilities.
The
Furon 1/4-in.
UPRP pressure regulator is available in both manual- and pneumatic-actuated
versions. The regulator delivers aggressive pure chemicals and
DI water at precisely determined levels while maintaining constant
downstream pressure. Its body is constructed from 100% virgin
injection-molded high-purity PFA, while the diaphragms are made
of PTFE/Fluoroloy T, which helps to prolong regulator life.
The result is a regulator with a high-purity, all-fluoropolymer
wetted flow path that can operate in temperatures up to 194°F.
The unit features a PTFE isolation bellows designed to protect
system chemistry. The pneumatically actuated version features
a secondary diaphragm to protect the compressed-air system.
Standard on both versions is an integral leak-detection port
that simplifies monitoring in critical applications. (Semicon
Japan)
An
integrated metrology tool combines two measurement technologies.
The NanoOCD/DUV 9010 incorporates both ultraviolet optical critical
dimension (OCD) spectroscopic ellipsometry and deep ultraviolet
(DUV) spectroscopic reflectometry. The instrument provides thin-film
and film-stack thickness measurements on pads as well as oxide,
nitride, and trench profile measurements on arrays. The complete
metrology technology, providing measurements over the entire
range of measurement requirements for each process, can be used
for lithography, CVD, copper CMP, dielectric CMP, polysilicon
etch, and dielectric etch applications. The tool features polarized,
normal-incidence spectroscopic ellipsometry for noncontact OCD
measurements in the 320–780-nm wavelength range. Its DUV
spectroscopic reflectometry function provides single- and multilayer
film-thickness measurements as well as information on film optical
properties and reflectance in the 190–780-nm wavelength
range.
Cleanroom-compatible
filters can minimize defects caused by airborne molecular contamination
(AMC). The Purafilter-CG and Purafilter-FFU use patented dry-chemical
media to target specific groups of gases in specific cleanroom
areas. The media permanently remove AMC by transforming the
gases into harmless solids. The filters do not contain materials
that produce chemical contamination, nor do they offgas trace
metals or dopants. They can be incorporated into most fan filter
units upstream of HEPA/ULPA filters. Three media types are offered:
CPS, used for removing hydrogen sulfide, sulfur dioxide, organics,
and ozone in wet hoods and metal deposition applications; PSAM,
used for removing acids, amines, ammonia, and NMP in photolithography
applications; and PSPB, used for removing arsine, boron trifluoride,
chlorine, hydrogen chloride, hydrogen fluoride, hydrogen sulfide,
and phosphine in etch, ion implantation, and metal deposition
applications.
An
updated version of the HSLIS-series in situ liquid optical particle
counters comes with Ethernet capability, enabling manufacturers
to use existing Ethernet networks to control and monitor multiple
particle counters and thus lower overall costs. Furthermore,
the particle counters now contain a Hitachi laser diode, which
substantially increases laser life and provides improved mechanical
stability and lower laser operating temperature. Used for measuring
filter efficiency and performing real-time control of particulate
contamination in ultrapure water and process chemicals, the
counters have sizing thresholds starting at 0.05 µm for
DI water and 0.06 µm for process chemicals. The units are
available with four sizing channels and can be easily integrated
into facility monitoring systems. (Semicon Japan)
A
storage system and 300-mm sorter promote automated material
handling. The integrated unit combines the Clean Stocker CLS-50
automated storage system with Recif's SIS300-series sorter.
The system improves the flexibility of a fab's wafer transport
system while reducing lead times and tool footprint. Featuring
a modular design, the fast, compact system can be expanded as
needed with minimal downtime. The high-throughput unit has an
average cycle time of 13 seconds, and with its HID noncontact
or brush-type power supply, it meets Class 1 cleanroom standards
and complies with all SEMI and safety standards. The SIS300
sorter uses a patented transfer technology, providing embedded
wafer alignment and ID read with vacuum-free edge contact. (Semicon
Japan)
An
extractive gas-detection system continuously monitors gas-storage
areas, process tools, scrubber systems, and other areas where
maintenance access may be limited or undesirable. Featuring
a sophisticated electronic "brain" built directly into the sensor
electronics, the Air Check Advantage extractive gas monitor
detects hazardous gas leaks and releases while significantly
reducing calibration and maintenance time and labor. Available
for ammonia, chlorine, fluorine, HCl, HF, hydrides, and many
other toxic or corrosive gases, it monitors locations up to
100 ft away. Standard features include a local digital display,
4–20-mA analog output, and a renewable plug-in sensor.
For simple off-site calibration, the instrument incorporates
self-supervised electronics that automatically alert personnel
to the condition of the sensor, the wiring, and smart sensor
electronics.
The
fully integrated, real-time Octopus ESD monitoring system controls
electrostatic damage to ICs during handling. Installed on IC
handlers, the system monitors ESD exposure to each individual
IC at each step of the handling operation. ICs exposed to elevated
ESD levels are automatically separated to prevent shipment of
exposed components. Statistical data on the ESD environment
inside the handler are collected and an alarm is issued if the
number of discharges exceeds preset levels. The monitor helps
to increase yields by providing real-time alerts to personnel
about ESD incidents. Continuous monitoring of ESD events and
separation of exposed components improves process reliability.
MicroLynx,
a machine control system, is a panel-mounted assembly with a
bipolar stepper motor microstepping drive. Small enough to fit
in the palm of the hand, the easy-to-install system is available
with two drive selections: 12–48 V dc, 3 A rms, 4 A peak;
and 24–75 V dc, 5 A rms, 7 A peak. A version of the unit
with the DeviceNet option conforms to ODVA volume II, release
2.0, errata 3, as a position controller (device type 16). Communication
with the controller is accomplished through either I/O or explicit
messaging, and upgrading the product in the field is accomplished
with an optional DeviceNet programmer cable.
SmartPump,
a vacuum management tool, offers a reliable, safe option for
all mechanical vacuum pump applications. The pump features high-vacuum
flow, low air consumption, an intuitive programming interface,
intelligent part present, and automatic blowoff. The pump's
intuitive interface controls vacuum. The pump generates vacuum
and maintains the preset level for as long as the user needs
to hold the object. It generates only the vacuum it needs, when
it needs it. The intelligent, part-present function automatically
switches off the compressed airflow once the preset levels have
been achieved and only switch- es the air on again if a system
leakage is detected. The automatic blowoff function ensures
that when vacuum cups are used, they do not remain attached
to the object once the vacuum is released. Because it requires
only one air, vacuum, and electrical connection, the pump can
be installed quickly.
ULTRA
field emission scanning electron microscopes (FESEMs) provide
ultra-high-resolution topographic and compositional imaging
combined with an analytical specimen chamber. The ULTRA FESEM
has a fully integrated backscattered electron detector system.
The energy- and angle-selected back-scattered (EsB) detector
is positioned in the Gemini electron optical column directly
above the high-efficiency in-lens secondary-electron (SE) detector.
The EsB detector is used for imaging with backscattered electrons,
providing compositional information about the specimen surface.
The EsB detector is an integral part of the Gemini column and
is easy to use. The SE detector is used for clear imaging of
surface details with secondary electrons. The instrument provides
clear imaging of boundaries and features, since backscattered
electrons are not highly sensitive to charging and edge contrast,
making it useful for metrology applications.
The
OmniStar mass spectrometer monitors the gas output of semiconductor
fab scrubber/abatement systems for toxic and greenhouse gases.
The unit monitors gas emissions continuously and can measure
up to 64 different ones simultaneously in concentrations from
100% down to ≤10 ppm. It monitors the gas output of scrubber/abatement
systems to ensure that they are operating properly and cleaning
up exit gases. If a gas concentration exceeds specified limits,
an out-of-range warning informs fab personnel that corrective
action should be initiated. 