Schlumberger Verification Systems says it is the first supplier to offer critical shape metrology (CSM) on a CD-SEM. Capable of producing highly accurate 3-D shape information on the company's Yosemite system, the technique integrates standard measurement data with a physics-based model to provide sidewall profiles, feature heights and widths, and other relevant critical shape information. These enhancements are achieved without causing sample degradation or compromising system precision or speed. The CSM technique was developed in collaboration with Spectel Research and the National Institute of Science and Technology (NIST).

The FlashClean Advantage bundles together improved hardware, software, and process features for FSI's Zeta surface conditioning system. Designed to enhance the platform's productivity and performance, the package is available on new tools as well as for field upgrades in the installed base. The company says that FlashClean's cycle time reductions help all Zeta applications, including BEOL post-ash cleans where times have been reduced by 15–30% shorter compared with competing batch-spray and single-wafer wet systems. Excellent particle performance down to 60 nm provided by the upgrade also results in improved die yields. (Semicon Taiwan)

Air Products has broadened its gas delivery product line with Gasguard TE1, an economical, ultra-high-purity system for inert, flammable, and oxidizer gases. Featuring text-enabled controller interface and configuration options, the unit costs up to 40% less than a standard gas cabinet, making it suitable for budget-conscious universities, research facilities, and manufacturers involved in process development. The TE1 is part of the company's recently launched electronics equipment solutions business unit's line of products. (Semicon Taiwan)

Mentor Graphics has increased the accuracy and extendability of its Calibre suite of resolution enhancement technology (RET) tools. Calibre VT5 and TCCcalc push the suite's RET silicon modeling and OPC capabilities to 65-nm technology node applications and beyond. The company says it spent more than 18 months engineering and beta testing the deep-subwavelength modeling techniques in leading 90- and 65-nm R&D fabs. Upgraded custom illumination support and image optimization algorithms also resulted from the product R&D work.

Genmark Automation's EZTeach system greatly reduces robot teaching times. Expanded features include a comprehensive set of algorithms, apparatus, teaching wizards, and fully developed diagnostic scripts. A key part of the EZTeach package is the intelligent teach pendant terminal, which is based on Pocket PC–compatible PDAs. Robot programming can take less than 15 minutes compared with the few hours that traditional teaching techniques take, helping to reduce process tool downtime for maintenance or repairs.

Luxtron has been awarded a patent for in situ temperature measurement of wafers and other substrates during semiconductor processing. U.S. Patent 6,572,265, titled "In Situ Optical Surface Temperature Measuring Techniques and Devices," includes several novel optical methods and sensors, such as those based on the company's Fluoroptic thermometry technology. The company says several designs are already integrated into production 200- and 300-mm plasma etch tools at two top OEMs and are due to be released by several PVD equipment manufacturers this year.

General Chemical's Web site, www.genchemcorp.com, has several new customer-service features. Among the expanded offerings are on-line product certificates of analysis and order tracking. Electronic chemicals group customers that are registered users can log on to the site and get information immediately about the status of their orders or analysis certificates. (Semicon Taiwan)

Two specular reflectance standards for high- and low-reflectivity surface measurements have been introduced by Ocean Optics. The STAN-SSH high-reflectivity standard (which comes in a NIST-traceable version) is a mirrored, fused silica optical standard for optical substrates and coatings, machined metals, and semiconductor materials. It offers nearly 90% and 85–98% reflectance across the 200–800-nm and 800–2500-nm wavelength ranges, respectively. The STAN-SSl low-reflectivity standard is a black glass standard that can be employed for measurements of thin-film and antireflective coatings, blocking filters, and substrates. It provides approximately 4% reflectance across the 200–2500-nm wavelength range.

A pellicle service from the Image Technology subsidiary of Suss Microtec reduces the cost of ownership of 1X photomasks. The service enables customers to protect their full-field photomasks (up to 14 in.) from contamination using mask pellicle technology (MPT). The service allows immediate customer access to fully inspected photomasks without the need for them to invest in their own pellicle application process and inspection equipment. MPT involves coating a full-field photomask with a thin layer that protects the mask from being contaminated during exposures with resist residue and particles from the wafer, effectively eliminating mask cleaning in proximity printing and even contact printing. The system makes 1X full-field lithography a cost-effective technology for volume production of thick-resist applications. (Semicon Taiwan)