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Mask
Number |
Top
Coat |
Developer |
Develop
Tool |
Etch
Tool |
Postdevelop
Defect
Counts |
Postetch
Defect
Counts |
Total
Defects |
Defects
after
Develop (%) |
Defects
after Etch
(%) |
| 1 |
Yes |
A |
A |
A |
37 |
39 |
76 |
48.7 |
51.3 |
| 2 |
No |
A |
A |
A |
20 |
44 |
64 |
31.3 |
68.8 |
| 3 |
Yes |
B |
B |
B |
22 |
35 |
57 |
38.6 |
61.4 |
| 4 |
No |
B |
B |
B |
2 |
10 |
12 |
16.7 |
83.3 |
| 5 |
Yes |
B |
B |
B |
11 |
33 |
44 |
25.0 |
75.0 |
| 6 |
No |
A |
A |
A |
1 |
14 |
15 |
6.7 |
93.3 |
|
| Table I: Test results for masks with resist
A (1–5) and resist B (6), including the number and percentage of defects
found after develop and etch steps. |
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© 2007 Tom Cheyney
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