MICRO: Technical Programs

The following schedule showcases the conferences, workshops, symposia, and similar activities taking place before and during Semicon Southwest 2002. All events will take place at the Austin Convention Center. Since the program matrix is subject to change, we suggest you check for the lastest information on SEMI's Web site at www.semi.org.

MONDAY, OCTOBER 14

9 a.m.–6 p.m.

A Partnership for PFC Emissions Reductions

Cosponsored by SEMI, SIA, International Sematech, and SESHA

Chairs: Laura Mendicino, Motorola; Mike Mocella, DuPont Electronic Gases

Environmental Protection Agency Update

Scott Bartos, Environmental Protection Agency

World Semiconductor Council Update

Chuck Fraust, SIA

PFC Emissions Reduction from Semiconductor PE-CVD Process using an Alternative Chamber Cleaning Gas COF₂ or F₂

Katsuo Sakai, National Institute of Advanced Industrial Science and Technology

Progress and Challenges in PFC Reductions at AMD

Dan Seif, Advanced Micro Devices

PFC Emissions from a 200 mm Fab at the 90 nm Technology Node

Laura Mendicino, Motorola

In situ Cleaning of LPCVD Furnaces Using a Thermal NF₃ Etch Process

Eric Timmermans, ASM International

Control of PFC Emissions from Plasma Processes by Reactive Gas Addition

Victor Vartanian, Motorola

Advances in Reducing PFC Emissions and Gas Costs: Qualification and Implementation of c-C–₄F₈ Chamber Clean Gas in a Novellus Concept-2 Chemical Vapor Deposition Tool

Allen Evans, Advanced Micro Devices

Integrated Fluorine Supply Strategy for CVD Chamber Cleaning Applications
Nancy Irwin, BOC Edwards

Regulatory, Toxicity and Recommended Exposure Limit Considerations for Semiconductor Process Gases
Gary W. Jepson, DuPont Haskell Laboratory

Post-pump Abatement of Waste PFCs from Etch Tools by Atmospheric Microwave Surface-Wave Plasmas: Raised-Floor Integrated System for Multiple Chamber Exhaust Treatment
Jean-Christophe Rostaing, Air Liquide - Centre de Recherche

PFC Abatement System Monitoring with Infrared Spectrometry
Gregory T. Merklin, MKS On-Line Products

TUESDAY, OCTOBER 15

8 a.m.–12 noon

EHS Issues in Advanced Lithography Workshop Cosponsored by SEMI Chemical and Gases Manufacturers Group (CGMG) and International Sematech

The workshop will identify EHS issues associated with advanced lithography materials and processes and provide a PFAS update. It will allow for an information exchange from the perspectives of the photolithography research community, chemical and equipment suppliers, and device manufacturers. The goal is to gain a better understanding of the EHS challenges facing advanced lithography and how they affect each industry segment.

8 a.m.–12:30 p.m.

STEP: SEMI E78—Assessment and Control of ESD and ESA for Equipment

SEMI Standard E78 defines ways to minimize the negative impact of static charge in IC manufacturing and to establish the electrostatic compatibility of IC equipment. This half-day Standards Technical Education Program (STEP) will describe SEMI E78-0998 and review its use in the industry. Static-charge control issues, particularly in photolithography, will be discussed.

1 p.m.–5 p.m.

STEP: SEMI E89—Analysis of Gauge Measurement Capability

Until the adoption of SEMI E89 in 1999, the IC industry had no generally accepted method to carry out measurement system capability analyses (gauge studies). While this standard proposes a methodology for conducting such studies, only a limited example can be given because of the variety of measurement instruments. This program will show how to set up, conduct, and analyze the results of a gauge study according to SEMI E89.

3 p.m.–5 p.m.

SEMI Chemical and Gas Manufacturing Group (CGMG) General Meeting

The Chemical and Gas Manufacturers Group (CGMG) is a SEMI-sponsored special interest group for SEMI members who supply chemicals, gases, resists, and related products to the semiconductor industry. They hold regularly scheduled meetings in conjunction with Semicon shows held in the U.S., Europe, and Japan. The CGMG provides a forum and a point of focus for its members to address those issues of special importance to their segment of the semiconductor industry. This committee has an international membership and all interested parties are invited to become members.

WEDNESDAY, OCTOBER 16

8 a.m.–5 p.m.

Semiconductor Processing Technology
(Day 1 of 3)

Instructor: Dr. Peter Gwozdz, San Jose State University

To be successful in this industry, having an understanding of semiconductor processing technology is a must. This introductory course deals with wafer fabs. The material is presented in a familiar manner to answer very specific technical questions about how products relate to other parts of the wafer fab. The instructor, with two decades of hands-on engineering experience, encourages questions and takes the time to answer them all.

8:30–9:30 a.m.

Equipment and Materials Market Briefing

Lubab Sheet, Senior Market Analyst, SEMI

In this fast-paced industry, reliable market intelligence is required to make informed business decisions. This briefing will provide timely and accurate market data on semiconductor equipment and materials that will help companies gain a competitive advantage.

8:30 a.m.–12:30 p.m.

STEP: SEMI E116—Equipment Performance Tracking (EPT)

SEMI E116 EPT provides the model for the measurement of equipment performance that is inevitable for equipment engineering. In this Standards Technical Education Program (STEP), the concept and application of EPT will be introduced and its practical implementation described. The position of EPT is discussed in the domain of SEMI E10 equipment performance measurement.

THURSDAY, OCTOBER 17

8 a.m.–5 p.m.

Semiconductor Processing Technology
(Day 2 of 3)

FRIDAY, OCTOBER 18

8 a.m.–5 p.m.

Semiconductor Processing Technology
(Day 3 of 3)

TECHNICAL PROGRAMS