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THE NEXT LEVEL: SpeedFam-IPEC's
dry-in/dry-out Momentum300 is one of the CMP tools that
Novellus will market.
PHOTO
COURTESY OF SPEEDFAM-IPEC
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Novellus
Systems of San Jose is poised to enter the chemical-mechanical planarization
tool market. The manufacturer of deposition systems has signed an
agreement to buy SpeedFam-IPEC of Chandler, AZ, in a stock-for-stock
merger. A leading proponent of copper damascene processes, Novellus
sees the acquisition as a further step toward greater integrated
wafer processing. The Arizona tool manufacturer will form a new
product group for Novellus.
"We
view CMP as a key manufacturing technology which will have a significant
impact on the yield and performance of the interconnect structure,"
says Richard Hill, chairman and CEO of Novellus. "We believe that
the opportunity to interactively optimize the planarization, deposition,
and surface preparation for overall performance will give Novellus
a major advantage in extending copper/low-k processes to advanced
devices."
The
proposed deal also calls for Novellus to assume SpeedFam-IPEC's
net debt of approximately $115 million. The total value of the transaction
is $220 million. The boards of directors of both firms have already
approved the deal. Final signing is expected to take place during
the fourth quarter of 2002 following approval by SpeedFam-IPEC's
shareholders.
The
manufacturer of CMP equipment has been working with Novellus as
a member of the Damascus Alliance. The alliance focuses on technical
issues involving copper damascene integration. Richard Faubert,
president and CEO of SpeedFam-IPEC, says Novellus's "financial and
technical horsepower" presents a "great opportunity to bring our
Momentum 200- and 300-mm products to the market."
The
Momentum300 is designed to bridge the transition from 200- to 300-mm
wafers. The system has three proprietary technologies to ensure
acceptable throughput and process capability, the supplier says.
NEXT planarization delivers high-yield wafer lots, while Adaptive
Planarization Technology is designed to provide post-polish control.
In-line metrology capability accommodates both 13- and 25-wafer
FOUPs.