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Nanotechnology
Stepper
The
Model 1600DSA stepper, designed to meet the needs of the nanotechnology
market, is based on the 1X 1000-series product line. The fully
automated stepper offers 0.8-, 1.0-, and 2.0-µm-resolution
lens options. High wafer plane irradiance improves process throughput,
especially for thick resists, while low reticle expenses lead
to a low cost of ownership. The tool has dual side alignment (DSA)
capability and uses direct vision technology. Based on a proprietary
machine vision alignment system, direct vision incorporates an
off-axis microscope, which is capable of viewing images on the
back of the wafer while exposing features on the front. The tool
is supported by a worldwide service and support network. (Semicon
West, S.F., South Hall, Booth 2516)
Bung Plug
The
2-in. FluoroPure PE bung plug is used with FluoroPure 55-gal HDPE
drums for the safe transport of corrosive chemicals. Made of polyethylene
material, the plug has a seal retainer that self-aligns to prevent
leaks in the drums. It is compatible with tamper-evident covers,
which protect chemicals from accidental altering during transportation
or staging. A vented option is available for customers who transport
chemicals such as hydrogen peroxide, which require a venting system.
The single-piece vent design eliminates the need for a separate
3/4-in.
vent plug, reducing the possibility that leak paths or entrapment
areas will form. (Semicon West, S.F., North Hall, Booth 5944)
Metrology System
Combining
a simultaneous multiple angle of incidence laser ellipsometer
and an integrated DUV reflectometer with a photomultiplier detector,
S200/S300-ultra metrology systems can characterize nitrided
gate oxides. Measurements of thicknesses and nitrogen concentrations
of dielectric films of 15 to 20 Å can be performed accurately
and repeatably. The system also can characterize high-k materials
such as ZrO2 with the throughput and repeatability
required for production monitoring. By combining the company's
Pulse technology for opaque film measurements and transparent
gate measurement techniques, the system can precisely and reliably
characterize metal electrode gate stacks. The same combination
of techniques makes it possible to measure SiGe thickness, Ge
concentrations, Ge profiles in graded layers, local stress in
the SiGe lattice, and dopant concentrations. (Semicon West,
S.F., South Hall, Booth 1915)
300-mm Single-Wafer Handling
The
Swifter is a user-friendly system for single-wafer handling of
hand-carry (rush, monitor, test, engineering, send-head, or rework)
lots in automated batch-wafer production lines. The unit is a
small-footprint cart filled with one loadport adapter and up to
four of the company's FOUP-for-One single-wafer pods. The integrated
system enables rapid delivery of 300-mm wafers anywhere without
the use of an automated batch delivery system, allowing final
users to cut cycle times of hot lots, metrology wafers, and calibration
wafers. The SEMI E103-compliant system can extract or return wafers
from any 300-mm wafer sorter or process tool. (Semicon West,
S.F., Gateway, Booth 3125)
Low-k CVD Units
Planar
300 low-k dielectric CVD units are 200/300-mm bridge tools with
up to six process modules, dual robots, and standard FOUP or SMIF
interface capability. The Planar 300Ci is configured for
Orion ultra-low-k processing of copper damascene dielectrics.
Orion low-k dielectrics have k values to <1.9 and contain copper
diffusion barrier and etch stop materials. The dielectric enables
45-nm production. The robust, mechanically strong, and chemically
resilient dielectrics can be integrated with standard plasma etch,
clean, and copper polishing interconnect module technologies.
The Planar 300Ai is configured for low-k Flowfill processing of
aluminum metallization dielectrics. Flowfill low-k materials have
k values as low as 2.5 and are used in gap fill and planarization
processes. The Planar units have throughputs of up to 100 wafers/hr.
They are fully compliant with all SEMI 300-mm factory automation
standards, providing recipe upload/ data download capability and
wafer batch delivery from overhead or rail-guided vehicles.
(Semicon West, S.F., North Hall, Booth 5960)
On-Site Gas Sources
Electron
Transfer Technologies
Arsine
(AsH3) and germane (GeH4)
dopant gas sources avoid the hazards and storage limits of compressed
gas cylinders. The small on-site gas generators can be placed
next to a process tool and produce ultra-high-purity gas from
refillable canisters made of solid starting material. Unlike compressed
gas cylinders, the source canisters do not have storage limits.
They internally blend arsine or germane with hydrogen to provide
mixtures with 250-ppm accuracy. This on-the-fly blending offers
flexibility and eliminates delays caused by having to order calibrated
gas cylinder mixtures. Unlike subatmospheric sources, the gas
generator output pressure can be adjusted from subatmospheric
to 30 psig. This pressure rating increases the units' compatibility
with mass-flow controllers. The source canisters are safe enough
to be shipped by air.
Wafer Transfer System
YCAR
is an automatic, multicassette system for transferring 150- and
200-mm wafers to and from plastic carriers and quartz or silicon
carbide boats. The system features a compact, carousel-shaped
platform with up to 12 carrier positions. After flat alignment,
wafer counting, and rotation, the unit automatically loads 25
or 50 wafers into boats. Test or dummy wafers are loaded separately
from a dedicated carrier to their appropriate positions in the
boats. The system generates low particle levels and has a wafer
breakage rate of only 1 in 250,000. Carriers can be positioned
to the side or in front of the system. Typically transferring
300 wafers in 8 minutes, the YCAR reduces cycle times, since flat
alignment and wafer counting are performed in masked time. The
system measures 136 cm wide x
130 cm high x
100 cm deep. (Semicon West, S.F., South Hall, Booth 2207A)
Liquid-Level Switches
Pointense
LL-10-series liquid-level switches replace mechanical float-type
liquid-level devices for high- and low-level alarms, pump protection,
and auto-fill/auto-empty operations. Using ultrasonic technology
and solid-state surface-mount integral electronics, the switches
function reliably in virtually any liquid, eliminating the stickiness
and failures that mechanical float-type switches suffer after
extended use. With epoxy-sealed electronics, the switches have
1/2-
or 3/4-in.
NPT standard mechanical connections and are available in 316 stainless
steel and Tefzel to meet a wide spectrum of difficult environmental
applications. Customized special versions for OEM applications
are also available. The switches run on 6 to 30 V dc input power
and have transient reverse polarity protection. Two-wire-loop
power, relay, and source or sink current output types are available.
Digital Control Monitor
The
SmartMax II stand-alone digital control monitor performs area
monitoring of hazardous gases and vapors. Each unit continuously
monitors the readings from as many as four same-type sensors.
Monitoring multiple sensors enables users to lower the cost of
gas detection because there is less equipment to buy, install,
and maintain. The monitor works with a wide range of sensors in
many different applications, including combustible gases, toxic
gases, hydrocarbons, and oxygen. The unit comes equipped with
a 420-mA analog output and an RS-485 serial port. It has
three onboard programmable relays and runs off of ac or dc power
sources.
Motion and Machine Controller
The
BX2 is a highly integrated, 64-bit, RISC-based, multitasking,
Ethernet-capable motion and machine controller. About the size
of a cigar box, the unit contains up to 8 axes of control, up
to 6 onboard drives supporting various servo technologies up to
1600 W, and 46 onboard digital input/ output points. The controller's
real-time operating system includes a comprehensive set of easy-to-program
motion control features. A powerful syntax-free programming environment
simplifies robust applications development and tool integration.
A built-in Ethernet supports as many as 56 axes of controller
networking and a variety of external I/O expansion modules.
Moisture Standards
Trace
Source moisture permeation tubes supply standards for applications
requiring moisture levels from 5 ppb to 1%. The tubes offer reliable
calibration standards for critical, low-level moisture analysis.
Applications include quality assurance for high-purity gas users,
process streams where moisture levels are critical, and analyzer
upkeep where moisture sensors need moisture to remain functional.
Common levels include 200 ppb, 600 ppb, 12 ppm, and 34
ppm, all of which are compatible with self-calibrating analyzers.
At customary dilution flow rates, disposable permeation tubes
generate moisture levels up to 30 ppm, while refillable permeation
tubes generate moisture levels from 50 ppm to 1%.
X-Ray Diffraction Tools
Bede
Scientific Instruments
X-ray
diffraction tools for wafers measure epitaxial and nonepitaxial
film thicknesses, compositions, and layer roughnesses with high
accuracy. Other substrate parameters such as porosity, texture,
and stress can be measured as well. The systems use the company's
X-Ray Microsource, which provides high x-ray flux on sample spots
ranging in size from 500 x
500 µm down to 100 x
100 µm, which makes the tools suitable for performing nondestructive
point measurements on monitor wafers and dedicated product wafers.
Models are available for automated 300-mm fab lines or for compound
semiconductor companies. All systems can be equipped with software
for system control and data analysis and are compatible with such
front-end modules as FOUPs, SMIFs, or open cassettes.
Liquid-Flow Sensors
Designed
as an electronic alternative to ball-and-tube rotameters, Model
106F liquid-flow sensors precisely measure flow rates down to
15 ml/min. Their Teflon, Kalrez, and sapphire construction ensures
that they are compatible with most chemicals used in semiconductor
applications, including hydrofluoric acid, CMP slurries, and photodeveloper
solutions. The sensors have ±1% linearity (full scale) and
±0.2% repeatability (full scale), offering accurate readings
in critical applications. Seven different power and output configurations
are available, including analog and pulse. An advanced sensor
design ensures precise flow measurement with no particle generation
or contamination. (Semicon West, S.F., Esplanade, Booth 4426)
Pneumatic Diaphragm Pump
With
a maximum nominal capacity of 10 L/min, the SL 10 self-priming
pneumatic diaphragm pump is used for applications involving small
volumes of liquids. Liquid flows through the product chambers
of the center housing, while the air control system and air chambers
are located on the side. This design ensures that one part of
the housing contacts the liquid, reduces the number of flow bends
to two, and minimizes the surface area. There are no sliding parts
in the product chambers, and gaskets are used to dispense liquid,
reducing particle generation. The corrosion-resistant unit can
deliver acids and caustics. Its smooth, pore-free PTFE-TFM housing
parts offer universal resistance to chemicals. The pump is metal-free
and can be used in temperatures up to 200°C.
Substrate-Bonding Machine
Veldhoven,
The Netherlands
The
Asigs 200, a semiautomatic substrate-bonding machine, performs
silicon-on-anything process development and can transfer silicon
circuits to glass and other insulating materials. Developed primarily
for transfer of 200- and 150-mm wafers, the unit can produce 25
fully bonded wafer units per hour. It aligns silicon and glass
wafers to within 0.1 mm of the wafer edge and bonds them with
UV-sensitive adhesive. The adhesive is deposited onto the wafers
while they are pressed together and rotated, eliminating potential
air bubbles and ensuring that the silicon structures are uniformly
coated. The adhesive layer is cured with UV illumination and a
controlled temperature stage. The tool has a user-friendly interface
and real-time display of process parameters.
Wafer-Handling Software
An
upgraded software package for the RC-2005 and RC-3005 wafer-handling
alignment systems enhances system efficiency. The upgrades are
designed for engineers who must assess robot arm position and
achieve precise, repeatable alignment settings for different robot
types and tool sets. The software helps determine a robot's alignment,
find optimum teach values, and transfer those values to other
robots. When used for predictive-maintenance purposes, it can
track alignment data over time, support trend analysis and early
warning of failures, produce numeric readouts supporting robot
adjustment, engage Auto-Run software to accelerate system start-up,
and upgrade paths to extend software usability over a wide range
of robots. (Semicon West, S.F., North Hall, Booth 5003)

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© 2007 Tom Cheyney
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