Thermal Desorber

PerkinElmer

Norwalk, CT

The TurboMatrix thermal desorber can be used for gas chromatography sampling applications such as analyzing hard-drive components for residual greases and mapping cleanrooms for volatile organics. The GC accessory eliminates the need to manually prepare samples. Its graphical user interface with touch screen facilitates access to information, including visual displays of the desorber's operation, set points, temperature conditions, and pressure conditions. The device uses a two-stage solventless process to desorb analytes economically and produce accurate, reproducible results.

Plasma Workstation

Hiden Analytical

Warrington, Cheshire, UK

The HPR-100 plasma workstation optimizes all control and process parameters for investigating plasma activity and plasma interactions with organic, metallic, and composite substrates. The turnkey tool features an inductively coupled plasma cell integrated with both mass spectrometer ion mass/energy and Langmuir probe analyzers for characterization of process and surface interactions. The plasma cell is closely coupled with the manufacturer's EQP and ESPIon plasma probes to provide detailed analyses such as energy-resolved mass spectra and mass-resolved energy distributions of positive and negative ions; electron-energy distribution functions; and plasma potentials and densities, radicals, and functional groups. The cell comprises a radio-frequency generator, matching network, and four-stream flow control module. The workstation operates with a wide range of gas species, pressures, and plasma powers.

Ground-Quality Monitor

Novx

San Jose, CA

The M100 multipoint microprocessor-based reference-ground-quality monitor continuously checks workstations or process equipment for electrostatic discharge. The system offers either 8- or 16-channel ground monitoring, with audible and red-green LEDs for each channel for stand-alone operation and a digital output for direct interfacing with the manufacturer's multiplexing software. The monitor can detect very-low-level reference ground problems, with sensitivity below 50 mV. It also detects ac spikes and complete ground loss. The response speed is 3 nanoseconds, and accuracy is ±1 .

Aluminum Sputtering Target

Tosoh SMD

Grove City, OH

The Solo Plus aluminum sputtering target for advanced semiconductor manufacturing features fine average grain size and low particle generation for optimal film uniformity and predictable performance for all of the target's life and from target to target. The target's controlled crystallographic texture includes minimal variation in copper content throughout the evenly distributed microstructure. The high-purity target is bonded to a high-strength aluminum backing plate, producing a rigid structure that exhibits lower deflection than would a monolithic design. High strength in the flange area ensures mounting integrity.

Ion Implanter

Axcelis Technologies

Beverly, MA

The MC3 medium-current ion implantation system for 300-mm semiconductor manufacturing is designed to meet both existing and future manufacturing requirements. The fully automated serial processing implanter has evolved from the existing 8250^_HT 200-mm technology platform. The implanter's angular energy filter maintains a high level of beam purity over the range of 5­750 keV, and it has the ability to process indium and other species on the same system. The system's constant-focal-length wafer-scanning capability keeps the focal point of the ion beam equidistant from all points on the wafer regardless of tilt angle. This feature maintains uniformity and beam parallelism suited to high-tilt implants. A multitasking control feature facilitates editing of recipes, access to data, and communication with factory host systems without any impact on the production environment.

UHP Gas Purifier

NuPure

Manotick, ON, Canada

The Omni UHP purifier for process tools can remove impurities from inert gases, nitrogen, and hydrogen down to sub-parts-per-billion levels. The plug- and-play purifier requires no complicated electrical wiring, temperature control, or set-point calibrations. The component can be mounted on the wall, or a fully integrated system including all necessary valves can be created. Integral particle filters remove all particles 0.003 µm.

Reticle Inspection Tool

KLA-Tencor

San Jose, CA

The high-sensitivity TeraStar reticle inspection platform detects particle- or contamination-based and pattern defects on multidie pelliclized reticles, including those incorporating optical-proximity-correction and phase-shift mask features. Based on the manufacturer's STARlight technology, the high-throughput tool can detect defects 100 nm. The system's beam-splitting technology makes possible multibeam UV inspection, and its image computer supports the use of proprietary algorithms for high-sensitivity die-to-die pattern inspection. The tool can search for both contamination and pattern defects concurrently, and inspects both the pellicle surface and the backside of the reticle in a single operation. It can inspect a standard 6-in. reticle at maximum sensitivity in less than 1 hour, and it needs less than 20 minutes to examine a reticle's less-critical layers.

Deep-UV Microscope

TNP Instruments

Carson, CA

The DUV-250 microscopic imaging system can achieve magnification of 25,000x and real-time image resolution 0.25 µm. The magnification and resolution capabilities are achieved by means of a broadband mercury arc lamp and the instrument's optical configuration. The microscope is designed to fill the gap between visible-light and scanning electron microscopy without recourse to laser scanning and computer enhancement. Potential applications include failure analysis, photomask inspection, and mass-storage component examination.

Wafer Rinser-Dryer

Semitool

Kalispell, MT

A high-productivity rinser-dryer has been added to the Scepter line of 50-wafer, single-chamber, semiautomated batch processing tools. The Scepter rinser-dryer has an electropolished stainless-steel process chamber with double the capacity of its predecessors in the series. The chamber meets S8-99 ergonomic load-height guidelines. The wafer dryer couples centrifugal drying with heated filtered nitrogen and a low-pressure nitrogen purge to achieve optimal dryness and cleanliness. Because the process chamber and the substrate are rinsed simultaneously, secondary contamination is eliminated. The on-axis orientation of the rinser-dryer keeps wafers parallel so that both sides of all wafers are sprayed simultaneously, continuously, and uniformly. Other features include a multiple-nozzle spray, a brushless dc drive motor, a noncontact bowl seal, dampened actuation valves, and a static-reduction system.

Pressure Control/Flow Monitors

Lucid Treatment Systems

Hollister, CA

The Clarity line of pressure control and flow monitors offers process engineers options for programmable real-time control of bulk chemical and slurry distribution. The PLC-regulated fluid-dynamics control systems provide simple connectivity and flexibility. The first wet-process peripheral in the series, the Clarity LPC controls pressure by regulating the amount of fluid flowing from a bulk delivery loop and returning to a day tank. A pressure sensor measures distribution loop pressure against a set point in less than 50 milliseconds and responds to fluctuations by adjusting a high-purity control valve. The system comes in three models and two flow ranges.

PVD System

Applied Materials

Santa Clara, CA

Self-ionized plasma (SIP) PVD technology is available on the Endura and Endura SL metal-deposition platforms. The SIP technology deposits critical barrier/seed films in copper-based interconnects and liner/barrier layers in aluminum structures. It extends PVD technology into the 100-nm range by delivering conformal film coverage that matches the requirements for lining high-aspect-ratio interconnect structures. The system's process chamber includes a magnetron plasma source that maximizes ionization of the metal atoms in the chamber, thereby providing strong step coverage in small-geometry structures. Throughputs of 70 wafers per hour are possible. An integrated high-vacuum sequence is used with copper-based devices to line the interconnect structure with SIP tantalum/tantalum nitride and copper seed layers. For aluminum-based interconnect applications, SIP technology is used to deposit titanium as an underlayer in an aluminum slab/interconnect stack structure. It also can deposit titanium and titanium nitride liner/barrier films in contact and via structures.

Perfluorinated Elastomers

Parker Seal Group

Irvine, CA

Parofluor high-performance perfluorinated elastomers for use in semiconductor fabs provide long seal life in harsh environments and are manufactured in an ultra-high-purity production area to minimize contamination. Ultra-series materials include compounds offering distinctive physical properties and different performance capabilities. Resistant to steam, water, and a wide variety of chemicals, the materials can be formed into O-rings, molded shapes, slit-valve door seals, and other configurations. They retain their sealing ability after continuous exposure to temperatures 320°C in one formulation. A choice of black, white, and translucent materials is offered.

Wafer Sorter

MGI Electronics

Tempe, AZ

The New Phoenix V6 wafer sorter is a multifunctional stand-alone system that sorts wafers and performs 25 or 50 bulk transfers and 25- or 50-wafer randomization in approximately 4 minutes. The system easily interfaces with many cleanroom zones, such as diffusion areas for wafer tracking and test, probe, and metals areas for sorting, splitting, and compressing lots back to their original carriers. The system is SEMI S2-93 and SEMI S8-95 compliant and can be controlled remotely via an RS-232 data communication port.

Topology Analysis System

ADE Phase Shift

Tucson, AZ

The NanoMapper provides quantitative surface-height mapping of semiconductor device design rules down to 0.1 µm. The tool uses noncontact optical measurement technology to provide whole-wafer topology data for 200- and 300-mm wafers. By tracking the phase of the optical signal using an interferometric technique, the tool is able to offer subnanometer resolution. It is designed for characterizing nanotopology in the development of critical lithography integrated process sequences, revealing how well the wafer was polished and how well the epitaxial layer was grown.

Universal Mass Spectrometers

MA Tech Services

St. Louis, MO

Two universal mass spectrometer systems for fast, sensitive on-line gas analysis are compatible with all computer platforms. The GAM 300 performs routine analysis with high sample throughput and long accountability, providing process monitoring and control with virtually constant uptime. The GAM 500 UT is an ultratrace gas analysis system with capabilities to the low parts-per-billion range. Its gastight cross-beam ion source provides routine detection of the main and side components of gas mixtures and simultaneous analysis of trace components in ultrapure gases within seconds.

IPA Drying System

L-Tech

Mountain View, CA

The Avid isopropyl alcohol drying system for semiconductor and FPD substrates offers the process benefits of vaporless Marangoni drying. The system uses ultrasonic energy to atomize IPA into microscopic droplets above the wafer surface, creating the differential surface tension for drying without any need for heaters and cumbersome IPA-vapor safety equipment. The system is designed for silicon, gallium arsenide, and other III-V wafer-drying applications and can be integrated into a wet bench or used as a turnkey point-of-use dryer. Made of ultrapure materials and offering particle performance down to 0.16 µm, it can dry 300-mm wafers, III-V wafers to 150 mm, and FPDs 1 m across.

pH Sensor

Honeywell Sensing and Control

Freeport, IL

The DirectLine Model DL421 pH sensor combines microelectronics technology and solid-state sensing. The system features modular plug-in construction, a local display and keypad, self- diagnostics, and a remote mounting option for electrode submersion or special mounting needs. Display, configuration, and calibration capabilities are housed within a single IP 66­rated enclosure. The sensor's output connects directly to the input of any host monitor or control device that accepts standard 4­20-mA analog input and provides external loop power. The electronics module locks to the sensor for safety and reliability during operation.

Reinforced Teflon

Fluorotech

Gainesville, FL

A reinforced-Teflon diaphragm material for use in OEM valves is available in sheets as thin as 0.006 in. The material consists of chemical-resistant Teflon and stainless-steel cloth formed into a homogeneous substance. The virtually indestructible material displays very high tensile strength and resists the creep and cold-flow problems to which ordinary Teflon diaphragms are susceptible. The reinforced Teflon is inert to most chemicals. It operates continuously at 205°C and can tolerate 225°C for short periods.

IR Gas Monitor

Zellweger Analytics

Lincolnshire, IL

The InfraTox gas monitor is able to measure toxic gases such as C^₄F^₆, C^₄F^₈, C^₅F^₈, CH^₃F, SF^₆, and NF^₃ by photoacoustic infrared sensing. The monitor offers measurement ranges of 0 to 100 or 0 to 1000 ppm, depending on the gas targeted. The rugged instrument provides stable detection of hydrofluorocarbons, hydrochlorofluorocarbons, and perfluorocarbons without cross-interference from other gases. It also eliminates cross-sensitivity to water vapor. Its zero drift prevents false readings. The monitor is available in 1-, 4-, and 8-sample-point models. Three alarm levels are provided.

Dry Photoresist Stripper

ULVAC Technologies

Methuen, MA

The Enviro dry strip system removes dry resist and polymer residue from 150­200-mm wafers without using solvents or acids. Eliminating the need for wet stripping processes that use hydroxylamine-based solvents, the multichamber, single-wafer system decreases processing time and reduces the need to store and dispose of hazardous chemical wastes. Using up to six process gases, the tool incorporates both microwave and low-energy reactive ion etch plasma technology. The wafer is placed on a hot plate that is located downstream from the microwave discharge tube. Resist removal is monitored by optical emission with automatic end-point detection.

Ion Gauge Controller

Stanford Research Systems

Sunnyvale, CA

The IGC100 ion gauge controller is a Web-enabled device that monitors pressure from as many as two Bayard-Alpert ion gauges, two convection-enhanced Pirani gauges, and four capacitance manometers. The controller produces accurate, NIST-traceable pressure measurements. A touch screen display shows curves of pressure versus time. The controller comes with standard analog I/O ports and optional eight-channel process control. The Internet-ready device allows users to access their vacuum system from anywhere in the world. The controller has a standard RS-232 port. A general-purpose interface bus is also available.

Cleanroom Ceiling Grid

PortaFab

Chesterfield, MO

The FabLine gasket-seal ceiling grid system is engineered to interface with the manufacturer's FabLine modular cleanroom walls and UltraGuard fan filter units in a totally integrated cleanroom. The ceiling grid is compatible with wall systems and fan filter units made by other manufacturers as well. Offering the versatility of nonprogressive construction, the functional stick-built ceiling provides a 2-in.-wide structural grid with aluminum extrusions and zinc die castings that accept standard filter modules, light fixtures, and blank panels. The system can be incorporated into new or existing cleanrooms.

Water Vapor Pumps

Ricor Cryogenic & Vacuum Systems

Mountain View, CA

Coolstar pumps maximize the speed of pumping water vapor and minimize pumpdown time in high-vacuum subsystems such as loadlocks and transfer chambers for PVD, CVD, and implantation. Pump compressors are remotely placed to minimize space requirements in confined locations. A closed-cycle helium refrigerator reduces water temperature to freezing, reducing partial pressure of the water to a level as low as 10^­13 torr. Hoses carry room-temperature helium gas to and from the cold heads.

Air-Velocity Meter

Kurz Instruments

Monterey, CA

The portable 2440-series thermal anemometer offers an accuracy of ±1% in measuring air velocity in industrial hygiene, HVAC, combustion, and mass-flow applications. Suited for recording velocity traverses, the device can store up to 1500 data points and is spreadsheet compatible. It also measures temperature up to 500°C. The fully programmable meter features a backlit display. It is available with a fixed or extendable probe and with fast-response ceramic or rugged high-temperature MetalClad sensors. I/O options are RS-232, RS-485, and 4­20 mA.

Pipe-Mounting Collars

Stafford Manufacturing

Woburn, MA

Designed to ease changeovers, two-piece shaft collars made of steel, stainless steel, aluminum, or a variety of engineering plastics can be used to secure piping against virtually any surface. One side of the collar has a flat with a countersunk hole to facilitate attachment to the mounting surface. The pieces of the collar are joined by socket-cap screws and feature a smooth bore that holds piping with even force and no damage. Available bore sizes are 1/8 to 16 in. Depending on the construction material, anodized, bead-blasted, and electropolished finishes are offered.

Postetch-Residue Remover

EKC Technology

Hayward, CA

A plug-and-play substitute for EKC 200-series residue removers using hydroxylamine free base (HAFB), EKC220 is engineered to utilize the scarce HAFB more efficiently. It removes postetch residues from metal and vias safely and rapidly. The remover is compatible with cleaning equipment, chemical delivery systems, and waste disposal processes developed for use with the earlier products. It is also compatible with the manufacturer's worldwide returnable-container program.

Controlled-Resistivity Ceramics

Morgan Advanced Ceramics

Latrobe, PA

Specialty ceramics are suited for use in applications that require controlled electrical conduction or static-charge dissipation. The ceramics feature metallized, brazed, or bonded assemblies and come in a range of insulation and controlled-resitance ratings. Assembly and packaging occurs in a cleanroom to control potential contamination.

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