Inspection Microscopes

Nikon

Melville, NY

Highly stable Eclipse L200 and L200D IC-inspection microscopes incorporate patented CFI^₆₀ optics for clear images, high contrast, and minimal flare. Long working distances and high numerical apertures are possible even at the extremes of magnification, providing bright images with good edge-to-edge definition and with good signal-to-noise ratios that are even better when dark-field techniques are employed. The microscopes are designed for viewing, imaging, and documenting wafers, photomasks, reticles, and a variety of substrates, either independently or in combination with a wafer loader in an automated system. They can accommodate 8-in. wafers and 6-in.-diam masks. A single objective can be used with bright-field, dark-field, and differential interference contrast observation techniques.

Fiber-Optic Amplifier

Omron Electronics

Schaumburg, IL

A digital fiber-optic amplifier comes in a remote control version that includes special functions for mounting up to 16 sensors for close wireless communication between the sensors and a single power source. The E3X-DA-N-series amplifier can be programmed easily via a remote controller that facilitates the copying of settings established for one amplifier or a group to another one or group. As many as 10 amplifiers can be closely mounted without experiencing interference problems. An automatic power control feature ensures that the digital value obtained does not fluctuate, so that the high sensitivity required for such applications as detecting crystal glass is maintained.

Residue Remover

EKC Technology

Hayward, CA

The semiaqueous residue remover EKC660 for cleaning postetch residue in sub-0.18-µm semiconductor devices is offered as an alternative to hydroxylamine. Its semiaqueous chemistry cleans vias as well as metal lines without attacking metals or oxides and causing critical dimension loss. The cleaner makes possible a broad process window for wet clean processes employing automated wet benches and spray tools. Process times are 5 to 30 minutes. The environmentally friendly residue remover operates at 40°C, is water rinsable, and offers good bath life. Its low-viscosity chemistry ensures compatibility with critical semiconductor manufacturing equipment and filters, as well as with standard TEOS, thermal oxide, BPSG, low-k materials, aluminum, titanium, and tungsten, even at elevated temperatures.

Quartz Cleaning Tool

Quartz Cleaning Systems

Lewisville, TX

A retractable rotary, high-pressure oscillating spray nozzle system is featured in a fully automated acid-based quartz cleaning tool. The QCS 2000 is a user-programmable, vertical cleaning system capable of cleaning up to 300-mm vertical and horizontal furnace tubes in its 34 x 34 x 76-in. process chamber. With the use of fixturing, it can clean a variety of quartzware, carriers, and wafer boats. Features include a hands-off quartz transfer cart for furnace tubes, integrated mechanical and software capabilities, and excellent cleaning capabilities.

Plasma Doping System

Varian Semiconductor Equipment

Gloucester, MA

The single-wafer VIISta 10 P²LAD ultra-low-energy pulsed-plasma doping system delivers as-implanted profiles shallower than are possible with conventional beam-line architectures, at throughputs limited only by gas flow. Plasma doping allows high productivity at low energies. In addition, the absence of ion-beam deceleration eliminates energy contamination that can affect device yields. By integrating the processes of particle acceleration, chemisorption, and recoil implantation, the plasma doping system produces dopant profiles that more closely match the box-style profiles needed to achieve future junction requirements. It also generates minimal crystallographic damage, enabling greater control in the application of activation and anneal technologies. Short pulse lengths and short plasma lifetimes minimize particle nucleation and the risk of etching preexisting surface films, and the long periods between pulses make dose measurements simple and accurate.

Fabwide Wafer-Transport System

Asyst Technologies

Fremont, CA

The FasTrack overhead wafer-transport system is designed to move 300-mm wafers safely and efficiently throughout the fab. Features such as the FastMove tool-loading module and the local buffering of wafer carriers address important requirements of automated intrabay material handling. Designed to conform to SEMI interoperability standards, the system offers user-configurable, low-cost architecture to optimize productivity, equipment effectiveness, product protection, and overall manufacturing costs. It integrates interbay and intrabay transport systems. FastMove combines virtual stocking capability with direct tool loading to provide buffer storage within the bay; this local work-in-process storage eliminates the need to incorporate buffers into process tools and facilitates the rapid exchange of lots. Continuous-flow transport technology uses asynchronous conveyors to move wafers and reticles through the fab.

Plasma Impedance Monitor

Scientific Systems USA

San Jose, CA

A real-time plasma impedance monitor provides high-resolution measurement of critical radio-frequency (RF) plasma parameters. The SmartPIM in-line monitor fingerprints the plasma chamber by simultaneously measuring and displaying current, voltage, and phase of the first five Fourier components. Delivering a dynamic range of up to 140 dB, the device offers precision and consistency to support plasma process repeatability. Because the sensor head is transparent to RF, there is no reflected or absorbed power to necessitate requalification of the plasma process. The monitor can be used for process fingerprinting, process end-point detection, and process control in both R&D and production applications. It installs easily on existing process tools, and users can either collect data on a laptop PC or integrate the monitor into a data management system.

Evaporation System

Unaxis Semiconductor

Zurich, Switzerland

The Samson evaporation system features a split chamber layout that allows for simultaneous evaporation from different sources, which in turn makes possible the deposition of alloy materials in extreme ratios. The system layout is based on a vacuum chamber that is divided into a source chamber and a process chamber by a gate or isolation valve, with each chamber individually cryopumped. Having separate source and process chambers optimizes precision and purity. Since materials remain under vacuum during substrate loading and unloading, even highly reactive materials can be accommodated. A control panel and a thin-film transistor display are visible in the cleanroom and in the service room.

Mass-Flow Controller

Brooks Instrument

Hatfield, PA

The Quantim flowmeter and controller for low-flow applications is based on an adaptation of the large-flow Coriolis direct mass measurement technique and thus avoids the limitations of inferred mass measurement and control technologies. The flexible controller provides accuracy of better than 0.5%, regardless of the fluid being measured. Precision is unaffected by temperature, viscosity, pressure, or flow conditions. The device's through-flow path eliminates measurement error, downtime, and maintenance caused by clogging. The controller provides multivariable output to cover temperature, flow, and density and can be used in a variety of applications.

Film Metrology Software

Nanometrics

Sunnyvale, CA

A SEMI-compliant Windows NT-based film metrology software package has been developed for use in optical metrology, including spectroscopic ellipsometry, reflectometry, and Fourier transform infrared spectroscopy. The N2000 system has an easy-to-use graphical user interface that simplifies equipment operation and is globally applicable. It also offers multitasking functionality for enhanced productivity; jobs can be queued and recipes can be developed and data analyzed during routine metrology operations. The system facilitates recipe transfer from stand-alone to integrated metrology systems.

Water Treatment Systems

Aquafine

Valencia, CA

Custom-engineered water treatment systems designed for applications requiring multiple UV units are offered as turnkey systems, with several UV treatment chambers and electrical enclosures mounted on skids. The systems are custom-designed to fit within an allotted space, provide the required flow rate, and supply the specified UV dosage for a particular process. Their compact control cabinets house Aqualogic 2000 microprocessor controls that provide continuous UV system feedback, including absolute real-time measurement of UV intensity for validation and auditing of production processes. Each system can be configured so that UV intensity, temperature, lamp status, running time, and cycle count can be monitored from a desktop PC via a 4­20-mA signal. The systems are well suited for any application where TOC levels in the 0.5-ppb range are required.

Heat Exchangers

Solid State Cooling Systems

Pleasant Valley, NY

Cleanstream all-PFA wetted thermoelectric heat exchangers can control the temperatures of corrosive UHP fluids. The onboard units directly cool the process fluid in wet benches, providing a large power savings in comparison to units that use Freon in a remote chiller. Process fluid circulates through all-PFA Teflon tubing without any risk of contamination from a secondary cooling fluid. The heat exchangers control bath temperatures within ±0.05°C between 5° and 90°C. Mean time between failures is 120,000 hours.

ESD Floor Coating

Static Solutions

Marlborough, MA

A urethane-acrylic water-based ESD coating for conductive floor tiles dissipates static charges while protecting the floor's surface. Conducoat 6800 has a proprietary formulation that includes UV absorbers to help minimize UV-induced yellowing. The glossy, long-lasting coating displays good adhesion, low abrasion, and resistance to shoe marks and dirt. It contains no dioctylphthalates, nitrates, or chlorides to contaminate the environment. The coating is available in 1-, 5-, and 55-gal containers.

Turbomolecular Pump

Pfeiffer Vacuum

Nashua, NH

The high-performance TPH 2101 modular turbomolecular pump with integrated controller is designed for semiconductor processes requiring fast pump speed and high throughput, such as high-density plasma CVD and reactive ion etching. The device offers a pumping capacity of, for example, 1900 L/sec for N^₂. The pump supports customization of vacuum processes by providing plug-and-play capability; peripherals suited for specific vacuum applications can be added easily. The controller facilitates cable connections to peripheral devices that regulate venting, interlocking backing pumps, or heating, cooling, or temperature.

Quick-Disconnect Couplings

Colder Products

St. Paul, MN

ChemQuick CQN08-series quick-disconnect couplings made of virgin PTFE and featuring Chemraz seals are suitable for high-flow, ultrapure aggressive chemical applications. The construction materials minimize the generation of extractable contaminants, and the chemical-compatible seals use no lubricants. A patented nonspill design allows safe line disconnects; flow is instantly shut off on disconnection. The high-efficiency, low-turbulence flow path of the couplings produces a C^_V of 7.3 for the double-sided shutoff version and 9.4 for the single-sided design; flow capacity for water is >40 gal/min.

Toxic Gas Detector

Zellweger Analytics

Lincolnshire, IL

The XP Chemcassette toxic and hazardous gas detector is available with a sensor for hydrides used in semiconductor fabrication. The detector can run for 3 months without interruption. The hydrides version meets the proposed 2-ppb TLV requirement for arsine being reviewed by ACGIH. The XP range of hydride detectors can now detect AsH^₃, PH^₃, B^₂H^₆, and SiH^₄ and will be expanded to include other hydrides, mineral acid gases, chlorine, and ammonia.

Particle Sensors

Particle Measuring Systems

Boulder, CO

The Airnet family of aerosol particle sensors can measure contaminants continuously at multiple cleanroom locations and then transmit the data gathered in several ways. The sensors offer a range of sizing sensitivities down to 0.2 µm, with four sizing channels. Flow rates for sampling in critical production areas are either 0.1 or 1.0 cu ft/min. Constructed of nonshedding material and containing no pump or fan, the sensors can be mounted on a wall or a level work surface. Data can be sent via an Ethernet connection to a networked workstation or, in stand-alone configuration, to a touch screen data acquisition system.

Low-k Dielectric Materials

Dow Corning

Midland, MI

A pair of advanced low-k dielectric materials offer current and future performance capabilities with CVD and spin-on tools. Z3MS CVD dielectric is a versatile precursor that is compatible with copper damascene and aluminum applications. The safe, noncorrosive, nonpyrophoric organosilicon gas offers a dielectric constant of 2.7. It offers copper diffusion barrier, gap-fill, and passivation benefits and damascene etch-stop selectivity twice as good as that of silicon nitride. XLK spin-on dielectric is a low-k film family with dielectric constants of 2.5, 2.2, and 2.0. These films are designed to be used as intermetal dielectrics for both aluminum and copper interconnects.

In-Line Flowmeter

Fluid Components International

San Marcos, CA

The FlexMASSter ST98L in-line thermal mass flowmeter is suited for low-flow gas measurement. Its sensing element provides precision measurement over a wide flow range--in the case of air, 0.0062­1850 std cu ft/min at an accuracy of ±1% of reading plus ±0.5% of full scale. Repeatability is ±0.5% of reading. Although demonstrating low-flow sensitivity, the meter is able to operate over a 100:1 turndown. Available in remote and integral configurations, the instrument features smart electronics with nonvolatile memory and is field programmable.

Interconnect Measurement

Boxer Cross

Menlo Park, CA

The BX-30 advanced interconnect measurement system provides rapid nondestructive measurements of copper metal and dielectric structures for sub-0.18-µm features on product wafers. The system was designed for fast, in-line monitoring of such new processes as copper deposition and chemical-mechanical planarization (CMP), for which atomic force and scanning electron microscopy are not suitable. It employs three noncontact optical technologies, one of which measures postprocess line erosion in the array as well as the thickness and dishing of bond pads to establish process control parameters for the integrated damascene flow. The system is built on a fully automated modular platform designed for 200- and 300-mm wafers.

CMP Slurry Characterization

Matec Applied Sciences

Northborough, MA

Based on patented electrokinetic sonic amplitude technology, an instrument measures the surface electric charge of CMP slurries without sample dilution. The ESA-9800 measures zeta potential in 20 seconds, using a handheld probe, a stationary measurement cell, or a flow-through cell. Measurements of the isoelectric point (pH), dispersant concentration, and time effect are conducted automatically. The rugged instrument incorporates Windows-based software and an embedded Pentium processor.

Pressure Controller

Alicat Scientific

Tucson, AZ

A space-saving pressure gauge and control device offers response times as short as 50 milliseconds and pressure control ranges from negative to 100 psig. The four-channel Model GC12-4CH includes four independent pressure meters, control valves, and bleed valves, along with an integral field-programmable photoionization detection loop controller. Communication can be either digital or 0­5-V, 10-V, or 4­20-mA analog. Control accuracy is ±0.25% and stability is 0.1%. Process connections are specified by the customer.

Ultrapure Chemicals

Technic France

La Plaine Saint Denis, France

Ultrapure parts-per-trillion-grade solvents, acids, and blends are available for use in wafer fabrication. Products offered include acetic acid, IPA, PGMEA, DPGME, EEP, NMP, cyclopentanone, and other ketones. Applications for the PPT Grade line of chemicals include photoresists, photoresist strippers, edge-bead removers, drying agents, etchants, and cleaners.

Dielectric CMP Slurry

Cabot Microelectronics

Aurora, IL

The Semi-Sperse D7300 dielectric slurry developed for advanced inter-level dielectric (ILD) applications is designed to minimize microdefects on devices with geometries of 0.18 µm and smaller. The chemical-mechanical planarization (CMP) slurry benefits from a chemical innovation that lowers the concentration of mobile ions introduced during CMP, reducing CMP-induced defects. The ILD slurry can significantly reduce post-CMP microscratching and enhance planarization efficiency and device yields.

Wafer Carrier

Ebara Technologies

Sacramento, CA

The ECB-08WM Clean Box wafer carrier protects wafers from particles and airborne molecular contamination via ULPA and chemical filters and a built-in fan unit that distributes clean air to all wafer surfaces inside the box. The Clean Box provides three complete filtration cycles per minute. It is equipped with a rechargeable metal hydride battery and a recharger with an ac-to-dc adapter. The carrier holds 25 8-in. wafers and operates 80 hours between battery charges. This wafer-storage minienvironment maintains low concentrations of acidic, basic, and organic chemical contaminants while protecting wafers from contamination by particles smaller than 0.1 µm.

Flowmeters

McMillan

Georgetown, TX

Series 104 Flo-Sensors for liquids are flowmeters with stainless-steel housings and standard stainless-steel compression fittings. Available with 0­5-V-dc and pulse outputs for connection to a variety of displays, the flowmeters can measure flow rates ranging from 13 ml/min to 100 gal/hr. The sensors determine flow rate by means of a Pelton-type turbine wheel. They are rated for operation up to 500 psi, offer accuracy of ±1% of full scale and repeatability of ±0.2%, and come with a NIST-traceable certificate of calibration.

Ceramic End Effectors

NetMotion

Fremont, CA

Durable ultrathin end effectors made of high-grade ceramic alumina offer high levels of electrical insulation and heat, corrosion, and abrasion resistance. Standard vacuum and nonvacuum end effectors are available in paddle and fork designs with an edge-grip option, and custom designs can accommodate wafers up to 300 mm. Alumina purity ranges from 99.5 to 99.9%, depending on end-effector specifications. Silicon carbide versions of the tools are offered for high-temperature and thermal shock applications. An optional Teflon coating provides antistatic properties and smoothness.

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