INDUSTRY NEWS
European chip equipment initiative succeeds in putting region's toolmakers
on world map
A four-year-old initiative has succeeded in reversing the perception
that semiconductor manufacturing tools made by European companies, while
innovative, lack the productivity capabilities needed to compete with
equipment made by their counterparts in the United States and Asia.
The Semiconductor Equipment Assessment (SEA) initiative accomplished
this goal in two ways, asserts Jeff Bruchez, head of project interface
and dissemination in the SEA dissemination office. First, the program
has included extended equipment testing, primarily at IC manufacturers
and research institutes. The tests involved the efforts of global partners
from the United States, Japan, and South Korea. Second, it has ensured
that realistic targets were set and sought "via independent assessment."
"A high level of success has been achieved within SEA projects
to date, with significant improvements in performance, equipment reliability,
productivity, and user satisfaction," Bruchez says. Because the results
are produced by users--primarily chipmakers--instead of suppliers, then
independently evaluated by the SEA dissemination organization, the results
arguably have more credibility than if a supplier alone provided its own
assessment.
Initially sponsored by Esprit at its inception in 1996, SEA is
working within the Information Society Technologies (IST) program of the
European Community (EC) for the 19992002 period. SEA seeks "to provide
a platform for European equipment and materials companies to demonstrate
their emerging equipment to global users, not with quickie trials, but
in a prolonged, phased manner," Bruchez points out. The assessment plan
first sets up the "relevant state-of-the-art requirements" in the technological
application, then establishes "productivity metrics during a 12- to 18-month
project." The organization disseminates the results in the form of technical
papers, project articles, and wrap-up workshops for interested parties.
According to an internal poll, the approach is working to participants'
satisfaction, Bruchez notes. Ninety-five percent of IC manufacturers involved
in SEA viewed favorably the long evaluations with industrial involvement,
and 86% actually saw performance gains. Eighty-one percent of responding
manufacturers say the new technology or equipment offers more benefits
than the tools they used previously.
Bruchez points out that a recent survey by VLSI Research, the
San Josebased market research firm, shows "nine citations for European
Communitybased equipment companies that are now rated within the
top 10 in their relevant categories." Seven of the companies "have had
their equipment assessments completed in a total of 13 separate SEA projects,"
he notes.
Among the participants in the "user-driven" organization are tool
users from Europe, the United States, South Korea, Taiwan, and Japan.
The list includes AMD, Analog Devices, Applied Materials, MEMC, Samsung,
TSMC, TI, and Xerox PARC. Suppliers are based in Germany, the Netherlands,
United States, Belgium, France, Israel, United Kingdom, and Austria. Eleven
industrial research organizations based in Europe are also taking part.
More non-European companies take part in the program now than
European participants, a development that Bruchez calls "very significant"
for three reasons. One, there are more equipment users and a larger market
outside of Europe than within Europe. Two, non-indigenous IC manufacturers
with European plants emulate the decisions of their fabs back home in
making purchasing decisions. Three, European tool users will not purchase
European equipment unless it has a large installed base and worldwide
recognition. Before SEA was established, Bruchez notes that the involvement
of non-European tool users in EC projects was scarce.
"The list of participants shows that non-European users are interested
in European equipment and are actively participating in what they see
as worthwhile projects which they can both contribute to and gain useful
information from," Bruchez maintains, "not only on the equipment but also
related materials, applications, and solutions."
One major success that SEA points to is a centrifugal cleaner
for 200- and 300-mm wafer containers. Called the Milestone III, the system
was developed by Dynamic Micro Systems (DMS) to clean FOUPs, 200-mm open
cassettes, and wafer transport boxes. Evaluated at STMicroelectronics
fab in Crolles, France, between August 1998 and July 1999, the Milestone
removes hardened photoresist, CMP by-products, and metallic residues.
According to an SEA results bulletin, the system is designed as a bridging
tool that will make the transition from 200- to 300-mm processes cost-effectively.
The results from tests at STMicroelectronics and I300I in Austin,
TX, found the system to have a very low level of contamination with multiple
cleaning usage over the nine-month testing period "even better than at
the outset of usage of the equipment." Complete cleaning cycles totaled
3177, or the equivalent of 1332 hours of operation with no breakdowns
and no observable electrostatic discharge effects. The bulletin concludes
that the Milestone III offers combined benefits of centrifugal force and
optimized quartz halogen drying to provide high throughput and effective
cleaning of particulate and ionic contamination without distortion of
the containers.
Of the 43 projects undertaken under Esprit's aegis, 15 focused
on 300-mm technologies. Eight of these are in beta tests at user sites,
and seven are in alpha tests at equipment company facilities, Bruchez
says. "We decided in 1996 to be cautious but flexible when defining a
300-mm SEA policy. At the time the market was buoyant, and 300-mm was
being strongly urged by the users. We didn't want to push the equipment
companies too far too soon by insisting on 300-mm equipment only. We also
noted that double productivity gains could be gotten from improvements
to 200-mm equipment...at lower financial risk, so we devised a phased
approach."
A three-way approach enabled SEA to keep its hand in 300-mm development.
The approach involved SEA300 projects that evaluated alpha tools at equipment
company sites at lower budgets, while conducting higher budgeted assessments
at a few user sites such as I300I and SC300. SEA also set up a silicon
services center at Gressi CNET to provide structured wafers for process
and measurement trials.
SEA's annual budget is not fixed, but depends instead on the number
of projects presented and accepted each year. In the first four years
of its existence SEA had a $100-million budget, half of which was provided
by the European Community. Partners in the projects pitch in 50% of the
cost for each project. Proposals for 2001 will be evaluated in November,
and the selected projects will begin early next year.
Three of four projects recently begun in the new IST program have
a defect analysis or yield improvement focus. Project APC 300 will examine
incorporating the latest in situ diagnostic OEM equipment from ASI into
an advanced subsystem for total monitoring of plasma etch parameters.
The goal is to introduce real-time process control using the Hercules/APC
sensor diagnostics at a modular level. Project Oxepicle will assess the
Steag MicroTech 300-mm wafer cleaner for surface preparation before key
process stages such as gate oxide low-temperature silicon epitaxy. Finally,
Project Summit will look at the requirements for next-generation 300-mm
in-line wafer surface analysis with integrated TXRF. The equipment supplier
is GeMeTec.
Only a few disappointments have marred SEA's record of success,
Bruchez says. One project "did not meet the users' aspirations. The other
was a small company that went out of business for financial reasons during
its equipment evaluation." He did not wish to identify the companies involved,
adding that one of the SEA300 alpha projects did not start because the
company deferred its 300-mm activities during the industry recession.
It now says it will reapply to the program. Another firm had good technology
but its tool's throughput was unacceptable and could not be improved for
the targeted application. The company eventually decided to find a different
market for the equipment.
"Overall," Bruchez maintains, "SEA's success rate has been very
high."

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