Meeting
continues industry's drive to chip in on economic model
For such a small piece of real estate it carries a lot
of weight. Its tyrannical demands will have engineers and executives
meeting once again during the annual Semicon West trade show. International
Sematech will host the fifth in a series of meetings to discuss how
to continue building on this minuscule plot for the least amount of
money. We're speaking, of course, about a square centimeter of silicon.
At a global economic symposium on July 14 the consortium will present
the latest update on its efforts to model the dynamics of the relationship
among chipmakers, their suppliers, and the microchip. Planners hope
to further a dialog that will lead to agreement on an effective way
to reach the technology milestones in the International Technology
Roadmap for Semiconductors (ITRS) without running out of gas.
Is it safe to say then that technology has taken
a backseat to the dollar in the semiconductor industry? "Technology
has never really been in the driver's seat," responds Randy Goodall,
the chairman of the conference and associate director of the manufacturing
methods and productivity division at International Sematech. "It always
looks that way, but nobody goes to the next technology node because
their techie guys want to do something marvelous. It's always been about
dollars per square centimeter."
Ultimately, adds Goodall, "it's all economics."
As one of the founding members of I300I, he knows that the transition
to the larger wafer size and "all of the productivity enhancements that
we do . . . are all done to drive down the cost per square centimeter
of silicon."
How do you lower that cost and adhere to Moore's
Law without unduly burdening either chipmakers or suppliers? That's
the question this group grapples with. "There's never been an industry
that is so . . . in need of technology revolution on an ongoing basis
to the point where it's the business focus. That's where the semiconductor
industry is unique," Goodall points out. "It's imperative to have this
huge focus on the technical community to endeavor to come up with these
regular sorts of miracles."
Miracles may arrive regularly; however, so do unholy
business downturns. The entire industry economic modeling project arose
in response to a combination of the two factors in the bad old days
of two years ago, Goodall relates. The origins lay in the "I300I era
of International Sematech, where we were in the serious stuck-in-the-mud
mode of late 1998." Sematech met with suppliers to discuss "bootstrapping
the industry when the industry was suffering and didn't have enough
money to do R&D, and we were asking them for more tools, faster,
with new technology and larger wafer sizes."
That meeting led to four others, the most recent
in April. He calls that spring confab "the best meeting yet." Project
leaders shared a first draft of the economic model, which combines "bottoms-up
chip-level demand and top-down computations," says Goodall. The group
"actually overlaid some industry revenue scenarios" on top of these
calculations "and blended all those things to see what might happen
to supplier revenues." The group also examined 300-mm scenarios as well
as the "classical three-year technology nodes and two-year technology
nodes."
Project coordinators are striving mightily to make
the model as objective as they can, Goodall emphasizes. One of the revenue
scenarios factors in "an overcapacity downturn in 2003 . . . overlaid
onto a bottoms-up model look at the impact on suppliers." Of the participants
at the April meeting the conference chairman says: "I think they felt
we were trying to have an unbiased look at scenarios that could occur
based on past history. It wasn't an 'all-good-news-or-pressure-suppliers-to-do-all-that-we-say'
message."
"The thrust in the last few meetings has been to
try to do a very thorough check that the economic model is looking at
the parameters that do indeed drive the market," says John Cossins,
the U.S. strategic marketing manager for ASM Lithography (ASML) and
participant at the spring meeting.
At the April conference Cossins gave a presentation
that proposed a framework for a lithography supplier return-on-investment
(ROI) module. Cowritten by John Wiesner, a senior vice president of
engineering at Nikon Precision, the presentation showed the pressures
facing suppliers caught in what Cossins terms "the vicious cycle we
go through in these industries."
"One of the strongest points we wanted to put across
at ASML is that the industry recovered at exactly the same time as people
were considering the transition from steppers to scanners," he emphasizes.
The supplier was whipsawed by a rapid shift from the use of the former
tool to the latter. ASML found itself coping with an industry that was
"80% steppers and 20% scanners and then the following year went to 80%
scanners and 20% steppers within, say, 5%.
"If this had happened at a different time in the
business cycle the transition would have been smoother," Cossins laments.
Instead of seeing a year in which a gradual 50-50 transition eased the
supplier's burden, ASML had to deal with severe parts shortages that
made the need for industrywide planning all the more apparent. The ASML
presentation noted that the rapid introduction of new technology threatens
productivity and yield and carries with it the risk of higher process
development costs.
The meeting during Semicon West will have a segment
on lithography, which is "always singled out because it's a technology-driving
aspect of the industry," notes Goodall. He says the industry is at the
point of "moving away from historical optical extensions to some degree."
A lot of R&D dollars "are stacking up right around now" as the industry
examines alternatives such as extreme UV and Scalpel, says the conference
chairman.
Getting a handle on developmental costs isn't going
to be easy, though. "If you've got three competing technologies dividing
the market by thirds," problems are magnified by a factor of 10, since
each of the technologies "is going to get a third of the market," Goodall
points out. "We're trying to create a model of what the chip-level demand
might be, what the integrated device manufacturers' response to chip
demand might be, and then [factor in] some scenarios from the 200- to
300-mm transition and . . . the technologies from 0.18 to 0.13 to 0.10
µm." Sema-tech wants "to engage the suppliers themselves and ask,
'What does it cost to do one of these generations? Can you spread out
R&D for all aspects of 200- and 300-mm, and can we group them all
together for R&D purposes for 193-nm lithography?' "
The Sematech team has made some efforts to link
the economic model to yield benefits, says Denis Fandel, a Sematech
productivity analyst who works with "advisory folks from Intel and IBM
as well as suppliers." Yield-learning curves are built into the model
"to try to at least emulate what's going on from an overall industry
point of view. As such, we tend to be very sensitive to those particular
aspects of manufacturing. Because we tend to be really manufacturing
oriented we certainly try to deal with those things, so it's an important
ingredient in our model. It certainly has a dramatic effect on the results,
depending on what type of learning curves you assume."
Goodall adds: "It's not beyond the realm of possibility
to look at yield maps as factories come on line and do sensitivity analyses
on how fast those curves move to the number of fabs that really need
to be built." With chipmakers building "dozens and dozens" of multibillion-dollar
fabs annually, "they need to get their yields ramped up quickly."
In April the participants began to consider the
effect of using foundries on the industry's economic model. It's a topic
that Sematech also planned to address in a meeting in early June. "In
the model we presented in April we did not have a separate IC construct
for foundries. We're actually wrestling with that right now," Goodall
says. He points out there are "some pretty polar arguments" on whether
foundries accentuate or dampen industry cyclicality. One line of reasoning
holds that foundry use "minimizes the overcapacity situation . . . and
might eventually damp out some of the historical oscillation." However,
"the fact that 20 IC companies all want 15 to 20% of the market is a
problem we continue to live with."
On the other hand, competitive pressures usually
dictate that integrated device manufacturers (IDMs) "will not farm out
their critical products to foundries," Goodall notes. Once a downturn
begins, the IDMs "pull back on the foundries," giving them their less
competitive products. "The foundries who are spending most of the money
in capitalization plans suddenly put the brakes on the largest building
segment and this really throws the suppliers through a loop." Needless
to say, this line of reasoning holds that using foundries worsens the
business cycle.
Sorting out all these factors and putting them
into a workable model will take an ongoing effort, Fandel says. He envisions
a point in the future where the work "will stabilize enough so that
we're able to reduce the amount of effort and energy we're putting into
it." He doesn't see that happening in the near term, however. He says
Sematech plans to ask some universities to help incorporate some of
the macroeconomic factors that have an impact on the industry. "In that
way we hope to broaden our basis for this work and create more of a
lasting set of models."
"This activity is at a fairly technical level in
terms of economic issues," emphasizes Goodall. "It's intended to feed
this higher-level industry executive forum process where executives
from IC companies and equipment suppliers can talk about these big problems
in an industry that doesn't have quick and easy answers."
Despite some uncertainty about the ultimate product,
Cossins likes the fact that the Sematech-led effort has created a forum
for sharing information. "Reasonably, it's very difficult to quantify
what's going to come out of the meetings. The biggest achievement is
bringing together semiconductor manufacturers and equipment suppliers
in the same room to talk about the effect of technology acceleration
and gain a mutual understanding of the concerns on both sides." He says
the ITRS "was developed by semiconductor manufacturers with relatively
little discourse with the equipment suppliers."
Ironically, the need for a workable economic model
became evident at the April meeting, which, Cossins says, "was more
or less overtaken by pure delivery considerations for lithography equipment.
The original brief of the industry economic forum meeting was to come
up with a validation for the technology roadmap, to see what effect
the map has on the industry. But because of the current upturn in the
industry it more or less turned into a 'when-the-hell-can-we-deliver-one-of-these-type-things'
meeting."
By no means, though, is the ASML official discounting
the positive aspects of the overall effort. Cossins recalls being pleasantly
surprised when one of the semiconductor manufacturers at the April session
suggested the company might be willing to offset some of the costs involved
with stockpiling hardware. The offer came during a discussion about
the long lead times required to develop lithography systems. "There's
a fear of ordering deep UV today because it takes a year to a year and
a half to build inventory. Then the industry goes through a downturn
and we're left with all this inventory.
"The company in question suggested it might be
ready to absorb some of the financial risk," marvels Cossins. "That
was a first."
The International Sematech global economic symposium
will be held at the Palace Hotel, San Francisco on July 14. Information:
415/512-111; fax, 415/543-0671; http://www.sematech.org.